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Dr. Tony Y. Wu
at Inst of High Performance Comp
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Publications (1)
Proceedings Article | 4 December 2008 Paper
CD control enhancement by laser bandwidth stabilization for advanced lithography application
R. Peng, Tony Wu, K. W. Chang, C. P. Yeh, H. Liu, H. Lee, John Lin, Allen Chang, Benjamin Lin
Proceedings Volume 7140, 714041 (2008) https://doi.org/10.1117/12.804616
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Laser stabilization, Gas lasers, Signal processing, Beam controllers, Control systems, Laser applications, Lithography, Photoresist materials
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