Dr. Tsuneo Terasawa Profile

Dr. Tsuneo Terasawa

Senior Researcher at Shin-Etsu Chemical Co Ltd

SPIE Involvement:

Author

Publications (91)

Proceedings Article | 29 October 2014 Paper

Recent results from EUVL patterned mask inspection using projection electron microscope system

Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Masahiro Hatakeyama, Takeshi Murakami, Shoji Yoshikawa, Kenji Terao

Proceedings Volume 9235, 92351C (2014) https://doi.org/10.1117/12.2066134

KEYWORDS: Defect detection, Signal detection, Inspection, Target detection, Photomasks, Extreme ultraviolet lithography, Signal processing, Extreme ultraviolet, Image processing, Scanning electron microscopy

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Proceedings Article | 28 July 2014 Paper

Performance in practical use of actinic EUVL mask blank inspection

Takeshi Yamane, Yongdae Kim, Noriaki Takagi, Tsuneo Terasawa, Tomohisa Ino, Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose

Proceedings Volume 9256, 92560P (2014) https://doi.org/10.1117/12.2067566

KEYWORDS: Photomasks, Inspection, Surface roughness, Prototyping, Semiconducting wafers, Defect detection, Critical dimension metrology, Extreme ultraviolet lithography, Light scattering, CCD cameras

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Proceedings Article | 28 July 2014 Paper

Development of new inspection system with novel PEM for EUV pattern masks and its performance evaluation

Masahiro Hatakeyama, Takeshi Murakami, Kenji Terao, Kenji Watanabe, Yasushi Tohma, Tsuyoshi Amano, Ryoichi Hirano, Susumu Iida, Tsuneo Terasawa, Hidehiro Watanabe

Proceedings Volume 9256, 92560T (2014) https://doi.org/10.1117/12.2069901

KEYWORDS: Inspection, Extreme ultraviolet, Imaging systems, Defect detection, Image acquisition, Image processing, Photomasks, Sensors, Image sensors, Extreme ultraviolet lithography

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Proceedings Article | 28 July 2014 Paper

EUV patterned mask inspection performance of an advanced projection electron microscope (PEM) system for hp 16 nm and beyond

Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, Tsueno Terasawa, Hidehiro Watanabe, Masahiro Hatakeyama, Takeshi Murakami, Kenji Terao

Proceedings Volume 9256, 92560M (2014) https://doi.org/10.1117/12.2069723

KEYWORDS: Inspection, Defect detection, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Image processing, Data processing, Scanning electron microscopy, Target detection, Defect inspection

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SPIE Journal Paper | 24 June 2014 Open Access

Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope

Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

JM3, Vol. 13, Issue 02, 023012, (June 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.2.023012

KEYWORDS: Extreme ultraviolet, Microscopes, Photomasks, Scanning probe microscopy, Quartz, Transmission electron microscopy, Extreme ultraviolet lithography, Phase measurement, Scanning probe microscopes, Optical lithography

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Proceedings Article | 17 April 2014 Paper

EUV patterned mask inspection with an advanced projection electron microscope (PEM) system

Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Masahiro Hatakeyama, Takeshi Murakami, Kenji Terao

Proceedings Volume 9048, 90480Z (2014) https://doi.org/10.1117/12.2045412

KEYWORDS: Inspection, Defect detection, Photomasks, Extreme ultraviolet, Image processing, Extreme ultraviolet lithography, Algorithm development, Sensors, Detection and tracking algorithms, Integrated optics

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Proceedings Article | 17 April 2014 Paper

Experimental verification of the effect of phase defect shape on ABI signal intensity

Noriaki Takagi, Tsuneo Terasawa, Yukiyasu Arisawa

Proceedings Volume 9048, 904822 (2014) https://doi.org/10.1117/12.2046139

KEYWORDS: Semiconducting wafers, Atomic force microscopy, Data modeling, Inspection, Extreme ultraviolet lithography, Defect detection, Photomasks, 3D modeling, Geometrical optics, EUV optics

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Proceedings Article | 17 April 2014 Paper

At wavelength observation of phase defect embedded in EUV mask using microscope technique

Tsuneo Terasawa, Tsuyoshi Amano, Takeshi Yamane, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 9048, 904825 (2014) https://doi.org/10.1117/12.2046156

KEYWORDS: Extreme ultraviolet, Photomasks, Microscopes, Semiconducting wafers, EUV optics, Extreme ultraviolet lithography, Mirrors, Inspection, Critical dimension metrology, Lithography

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Proceedings Article | 17 April 2014 Paper

Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope

Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Takeo Watanabe, Hiroo Kinosihta

Proceedings Volume 9048, 904827 (2014) https://doi.org/10.1117/12.2046164

KEYWORDS: Extreme ultraviolet, Microscopes, Photomasks, Scanning probe microscopy, Multilayers, Quartz, Transmission electron microscopy, Extreme ultraviolet lithography, EUV optics, Semiconducting wafers

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Proceedings Article | 17 April 2014 Paper

Analysis of phase defect effect on contact hole pattern using a programmed phase defect in EUVL mask

Yongdae Kim, Tsuneo Terasawa, Tsuyoshi Amano, Sunghyun Oh, Yoonsuk Hyun, Hidehiro Watanabe

Proceedings Volume 9048, 90482Q (2014) https://doi.org/10.1117/12.2046571

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Extreme ultraviolet, Optical lithography, Phase measurement, Inspection, Erbium

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SPIE Journal Paper | 21 February 2014

Patterned mask inspection technology with projection electron microscope technique on extreme ultraviolet masks

Ryoichi Hirano, Susumu Lida, Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Masahiro Hatakeyama, Takeshi Murakami, Kenji Terao

JM3, Vol. 13, Issue 01, 013009, (February 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.013009

KEYWORDS: Inspection, Photomasks, Defect detection, Transmittance, Signal detection, Extreme ultraviolet, Image resolution, Electron microscopes, Sensors, Extreme ultraviolet lithography

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Proceedings Article | 20 September 2013 Paper

Extreme ultraviolet mask defect observation using an extreme ultraviolet microscope

Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 8880, 88802I (2013) https://doi.org/10.1117/12.2030819

KEYWORDS: Extreme ultraviolet, Microscopes, Photomasks, Semiconducting wafers, Scanning probe microscopy, Extreme ultraviolet lithography, Scanning electron microscopy, Critical dimension metrology, Reflectivity, Lithography

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Proceedings Article | 9 September 2013 Paper

EUV patterned mask inspection system using a projection electron microscope technique

Hidehiro Watanabe, Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, Tsuneo Terasawa, Masahiro Hatakeyama, Takeshi Murakami, Shoji Yoshikawa, Kenji Terao

Proceedings Volume 8880, 88800U (2013) https://doi.org/10.1117/12.2027566

KEYWORDS: Inspection, Image processing, Transmittance, Image sensors, Extreme ultraviolet, Photomasks, Signal processing, Electron microscopes, Image resolution, Sensors

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Proceedings Article | 9 September 2013 Paper

Development of inspection system for EUV mask with novel projection electron microscopy (PEM)

Masahiro Hatakeyama, Takeshi Murakami, Kenji Terao, Kenji Watanabe, Shoji Yoshikawa, Tsuyoshi Amano, Ryoichi Hirano, Susumu Iida, Tsuneo Terasawa, Hidehiro Watanabe

Proceedings Volume 8880, 888028 (2013) https://doi.org/10.1117/12.2027733

KEYWORDS: Imaging systems, Inspection, Extreme ultraviolet, Integrated optics, EUV optics, Sensors, Modulation transfer functions, Image acquisition, Extreme ultraviolet lithography, Transmittance

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SPIE Journal Paper | 30 August 2013 Open Access

Propagation of surface topography of extreme ultraviolet blank substrate through multilayer and impact of phase defect structure on wafer image

Tsuyoshi Amano, Tsuneo Terasawa

JM3, Vol. 12, Issue 03, 033015, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.033015

KEYWORDS: Palladium, Multilayers, Semiconducting wafers, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Etching, Optical lithography, Coating, Quartz

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Proceedings Article | 7 August 2013 Paper

Background level analysis on an actinic inspection image of EUVL mask blank

Takeshi Yamane, Myoungsoo Lee, Tsuneo Terasawa

Proceedings Volume 8701, 870117 (2013) https://doi.org/10.1117/12.2031583

KEYWORDS: Photomasks, Surface roughness, Atomic force microscopy, Inspection, Prototyping, Extreme ultraviolet lithography, Light scattering, Semiconducting wafers, Quartz, Image analysis

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Proceedings Article | 28 June 2013 Paper

Pattern inspection performance of novel Projection Electron Microscopy (PEM) on EUV masks

Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Masahiro Hatakeyama, Takeshi Murakami, Kenji Terao

Proceedings Volume 8701, 870116 (2013) https://doi.org/10.1117/12.2030653

KEYWORDS: Inspection, Photomasks, Defect detection, Signal detection, Extreme ultraviolet, Image resolution, Transmittance, Extreme ultraviolet lithography, Image sensors, Sensors

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Proceedings Article | 28 June 2013 Paper

Development of optical system on novel Projection Electron Microscopy (PEM) for EUV masks and its basic performance evaluation

Masahiro Hatakeyama, Takeshi Murakami, Kenji Terao, Kenji Watanabe, Yoshihiko Naito, Tsuyoshi Amano, Ryoichi Hirano, Susumu Iida, Tsuneo Terasawa, Hidehiro Watanabe

Proceedings Volume 8701, 87010S (2013) https://doi.org/10.1117/12.2030647

KEYWORDS: Inspection, Transmittance, Imaging systems, Extreme ultraviolet, Integrated optics, Modulation transfer functions, Electron microscopy, Photomasks, System integration, Sensors

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Proceedings Article | 28 June 2013 Paper

The capability of high magnification review function for EUV actinic blank inspection tool

Hiroki Miyai, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Ichiro Mori

Proceedings Volume 8701, 870118 (2013) https://doi.org/10.1117/12.2030712

KEYWORDS: Inspection, Mirrors, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Charge-coupled devices, Defect detection, Multilayers, Switches, Ions

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SPIE Journal Paper | 11 June 2013 Open Access

Extreme ultraviolet mask defect inspection with a half pitch 16-nm node using simulated projection electron microscope images

Susumu Iida, Tsuyoshi Amano, Ryoichi Hirano, Tsuneo Terasawa, Hidehiro Watanabe

JM3, Vol. 12, Issue 02, 023013, (June 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.2.023013

KEYWORDS: Extreme ultraviolet, Defect detection, Photomasks, Inspection, Defect inspection, Image processing, Monte Carlo methods, Electron microscopes, Sensors, Signal detection

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