Dr. Ulric B. Ljungblad Profile

Dr. Ulric B. Ljungblad

at Micronic Laser Systems AB

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Author

Publications (5)

Proceedings Article | 22 January 2005 Paper

A high-end mask writer using a spatial light modulator

Ulric Ljungblad, Per Askebjer, Tord Karlin, Tor Sandstrom, Henrik Sjoeberg

Proceedings Volume 5721, (2005) https://doi.org/10.1117/12.590934

KEYWORDS: Spatial light modulators, Mirrors, Micromirrors, Photomasks, Calibration, Optical alignment, Cameras, CCD cameras, Analog electronics, Reflection

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Proceedings Article | 22 January 2005 Paper

Mechanical stability of spatial light modulators in microlithography

Ulrike Dauderstadt, Peter Duerr, Ulric Ljungblad, Tord Karlin, Harald Schenk, Hubert Lakner

Proceedings Volume 5721, (2005) https://doi.org/10.1117/12.590082

KEYWORDS: Mirrors, Electrodes, Spatial light modulators, Micromirrors, Optical lithography, Laser development, Metals, Microopto electromechanical systems, Photomasks, Titanium

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Proceedings Article | 6 December 2004 Paper

Phase-shifting optical maskless lithography enabling ASICs at the 65- and 45-nm nodes

Tor Sandstrom, Ulric Ljungblad

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569258

KEYWORDS: Mirrors, Spatial light modulators, Phase shifts, Reticles, Lithography, Maskless lithography, Photomasks, Scanners, Optical proximity correction, Raster graphics

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Proceedings Article | 5 September 2001 Paper

Sigma7100: a new architecture for laser pattern generators for 130 nm and beyond

Torbjoern Sandstrom, Timothy Fillion, Ulric Ljungblad, Mats Rosling

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438402

KEYWORDS: Spatial light modulators, Deep ultraviolet, Photomasks, Mirrors, Micromirrors, Electrodes, Laser development, Microelectromechanical systems, Excimer lasers, Line edge roughness

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Proceedings Article | 22 January 2001 Paper

New architecture for laser pattern generators for 130 nm and beyond

Ulric Ljungblad, Torbjoern Sandstrom, Hans Buhre, Peter Duerr, Hubert Lakner

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410691

KEYWORDS: Spatial light modulators, Reticles, Mirrors, Photomasks, Laser applications, Analog electronics, Semiconducting wafers, Laser systems engineering, Microelectronics, Micromirrors

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