Prof. Ulrich Mescheder Profile

Prof. Ulrich Mescheder

Managing Director of the IAR at Hochschule Furtwangen Univ

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Author

Publications (8)

SPIE Journal Paper | 21 January 2014

Development of a focusing micromirror device with an in-plane stress relief structure in silicon-on-insulator technology

Wolfgang Kronast, Ulrich Mescheder, Bernhard Müller, Rolf Huster

JM3, Vol. 13, Issue 01, 011112, (January 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.011112

KEYWORDS: Silicon, Micromirrors, Mirrors, Electrodes, Semiconducting wafers, Distortion, Finite element methods, 3D modeling, Etching, Aluminum

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Proceedings Article | 13 March 2013 Paper

Development of a focusing micromirror device with an in-plane stress relief structure in SOI technology

Wolfgang Kronast, Ulrich Mescheder, Bernhard Müller, Rolf Huster

Proceedings Volume 8616, 86160Z (2013) https://doi.org/10.1117/12.2001229

KEYWORDS: Mirrors, Silicon, Semiconducting wafers, Micromirrors, Electrodes, Distortion, Finite element methods, 3D modeling, Oxides, Etching

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A new design concept for a dynamically focusing micromachined silicon membrane mirror with 6 mm diameter and electrostatic actuation was realized. To eliminate the influence of residual stress a special stress relief design of the membrane`s suspension was developed in order to achieve a distortion-free optical mirror (distortion < λ/10 (λ = 1064 nm). Even silicon membranes fabricated in SOI technology mostly suffer from buckling by residual compressive stress caused by mismatch in the coefficients of thermal expansion between silicon and the buried silicon oxide layer [1, 2].This often leads to severe distortion of stress sensitive devices such as membrane based micro mirror devices [3]. Even though a tensile pre-stress might improve the distortion in case of a non-deformed membrane, a tensile stress in the membrane increases the stiffness and thus reduces the sensitivity e.g. for capacitive sensors or for actuating devices. Different methods are reviewed for stress compensation or stress relief in membranes. We developed and fabricated a new stress relief structure which reduces the stress induced deformation of membranes and leads to substantially flat micromirrors of high optical quality. This is achieved by a special tangential beam suspension which allows an in-plane expansion or contraction of the membrane proportional to its inherent compressive or tensile stress. Optimized beam structures and the voltage dependence of the mirror’s deflection were determined by 3D FEM simulations. For membranes with a compressive pre-stress of -20MPa simulations show a decrease in bow to values < 18 nm in comparison with 700 nm for a conventional rigidly clamped membrane. A deflection of 16 μm within an aperture of 5 mm diameter is theoretically achieved by a voltage U₀ = 200 V resulting in a minimal focal length of 97 mm. The fabricated devices have been characterized by the means of interferometric optical measurement. The measurement results are in good agreement with the theoretical prediction of FEM simulations.

Proceedings Article | 5 May 2011 Paper

3D capacitive vibrational micro harvester using isotropic charging of electrets deposited on vertical sidewalls

Antwi Nimo, Ulrich Mescheder, Bernhard Müller, Awad Saad Abou Elkeir

Proceedings Volume 8066, 80661Q (2011) https://doi.org/10.1117/12.886876

KEYWORDS: Silica, Electrodes, Semiconducting wafers, Capacitance, Oxides, Capacitors, Etching, Silicon, 3D modeling, Aluminum

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Proceedings Article | 25 November 2010 Paper

Microfluidic system for single cell sorting with optical tweezers

Thomas Bruns, Laszlo Becsi, Marc Talkenberg, Michael Wagner, Petra Weber, Ulrich Mescheder, Herbert Schneckenburger

Proceedings Volume 7376, 73760M (2010) https://doi.org/10.1117/12.871450

KEYWORDS: Optical tweezers, Microfluidics, Glasses, Silicon, Plating, Polymethylmethacrylate, Polymers, Laser applications, Ovary, Nd:YAG lasers

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Proceedings Article | 17 February 2010 Paper

Development of a tilt actuated micromirror for applications in laser interferometry

Wolfgang Kronast, Ulrich Mescheder, Bernhard Müller, Antwi Nimo, Claus Braxmaier, Thilo Schuldt

Proceedings Volume 7594, 75940O (2010) https://doi.org/10.1117/12.839577

KEYWORDS: Mirrors, Semiconducting wafers, Micromirrors, Electrodes, Finite element methods, Silicon, Deep reactive ion etching, Laser interferometry, Space operations, Nanoimprint lithography

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Proceedings Article | 25 April 2008 Paper

Optimisation and characterisation of parabolic membrane mirrors

T. Hellmuth, K. Khrennikov, W. Kronast, R. Huster, U. Mescheder

Proceedings Volume 6993, 699305 (2008) https://doi.org/10.1117/12.780758

KEYWORDS: Mirrors, Electrodes, Etching, Interferometers, Semiconducting wafers, Silicon, Finite element methods, Modulation, Charge-coupled devices, Oxides

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Proceedings Article | 21 April 2006 Paper

Active focusing device based on MOEMS technology

Ulrich Mescheder, Zoltan Torok, Wolfgang Kronast

Proceedings Volume 6186, 618601 (2006) https://doi.org/10.1117/12.659826

KEYWORDS: Electrodes, Mirrors, Etching, Microopto electromechanical systems, Finite element methods, Silicon, Deep reactive ion etching, Beam shaping, Distortion, Control systems

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Proceedings Article | 16 August 2004 Paper

A new micromachined optical fiber switch for instrumentation purposes

Mark Herding, Gergoe Somogyi, Ulrich Mescheder, Peter Woias

Proceedings Volume 5455, (2004) https://doi.org/10.1117/12.544798

KEYWORDS: Switches, Electrodes, Chromium, Light, Zemax, Waveguides, Geometrical optics, Optical fibers, Etching, Switching

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Showing 5 of 8 publications

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