Dr. Vijaya-Kumar Murugesan Kuppuswamy Profile

Dr. Vijaya-Kumar Murugesan Kuppuswamy

Post Doctoral Fellow at imec

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Publications (6)

Proceedings Article | 17 October 2014 Paper

Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy

Joost Bekaert, Jan Doise, Vijaya-Kumar Murugesan Kuppuswamy, Roel Gronheid, Boon Teik Chan, Geert Vandenberghe, Yi Cao, YoungJun Her

Proceedings Volume 9231, 92310R (2014) https://doi.org/10.1117/12.2066647

KEYWORDS: Critical dimension metrology, Transmission electron microscopy, Optical lithography, System on a chip, Etching, Polymethylmethacrylate, Cadmium, Scanning electron microscopy, Lithography, Directed self assembly

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Proceedings Article | 27 March 2014 Paper

Process optimization of templated DSA flows

Roel Gronheid, Joost Bekaert, Vijaya-Kumar Murugesan Kuppuswamy, Nadia Vandenbroeck, Jan Doise, Yi Cao, Guanyang Lin, Safak Sayan, Doni Parnell, Mark Somervell

Proceedings Volume 9051, 90510I (2014) https://doi.org/10.1117/12.2047266

KEYWORDS: System on a chip, Scanning electron microscopy, Optical lithography, Etching, Photomasks, Thin film coatings, Coating, Metrology, Materials processing, Directed self assembly

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SPIE Journal Paper | 25 January 2013

Effects of image noise on contact edge roughness and critical dimension uniformity measurement in synthesized scanning electron microscope images

Vassilios Constantoudis, Vijaya-Kumar Murugesan Kuppuswamy, Evangelos Gogolides

JM3, Vol. 12, Issue 01, 013005, (January 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.1.013005

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Image filtering, Edge roughness, Image analysis, Electron microscopes, Materials processing, Edge detection, Metrology, Lithography

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Proceedings Article | 5 April 2012 Paper

Noise effects on contact-edge roughness and CD uniformity measurement

V. Constantoudis, V.-K. Murugesan Kuppuswamy, E. Gogolides

Proceedings Volume 8324, 83240K (2012) https://doi.org/10.1117/12.918014

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Image filtering, Edge roughness, Image analysis, Edge detection, Materials processing, Metrology, Line edge roughness, Solids

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Proceedings Article | 21 March 2012 Paper

Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer

Vijaya-Kumar Murugesan Kuppuswamy, Vassilios Constantoudis, Evangelos Gogolides, Alessandro Vaglio Pret, Roel Gronheid

Proceedings Volume 8322, 832207 (2012) https://doi.org/10.1117/12.918033

KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Edge roughness, Extreme ultraviolet lithography, Scanning electron microscopy, Picosecond phenomena, Lithography, Transistors, Line edge roughness, Ions

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Proceedings Article | 20 April 2011 Paper

Contact edge roughness (CER) characterization and modeling: effects of dose on CER and critical dimension (CD) variation

Vijaya-Kumar Murugesan Kuppuswamy, Vassilios Constantoudis, Evangelos Gogolides, Alessandro Vaglio Pret, Roel Gronheid

Proceedings Volume 7971, 79710Q (2011) https://doi.org/10.1117/12.881592

KEYWORDS: Critical dimension metrology, Line edge roughness, Scanning electron microscopy, Picosecond phenomena, Edge roughness, Metrology, Stochastic processes, Semiconducting wafers, Extreme ultraviolet lithography, Transistors

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Showing 5 of 6 publications

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