Dr. Vishnu Kamat Profile

Dr. Vishnu Kamat

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 13 March 2012 Paper

Free form source and mask optimization for negative tone resist development for 22nm node contact holes

Tamer Coskun, Huixiong Dai, Vishnu Kamat, Ching-Mei Hsu, Gaetano Santoro, Chris Ngai, Mario Reybrouck, Grozdan Grozev, Hsu-Ting Huang

Proceedings Volume 8326, 83260V (2012) https://doi.org/10.1117/12.918459

KEYWORDS: Photomasks, Source mask optimization, Semiconducting wafers, Image processing, Electroluminescence, Standards development, Nanoimprint lithography, Optical lithography, 3D modeling, Data modeling

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Proceedings Article | 5 April 2011 Paper

DPT restricted design rules for advanced logic applications

Yunfei Deng, Yuangsheng Ma, Hidekazu Yoshida, Jongwook Kye, Harry Levinson, Jason Sweis, Tamer Coskun, Vishnu Kamat

Proceedings Volume 7973, 79730H (2011) https://doi.org/10.1117/12.879793

KEYWORDS: Double patterning technology, Optical lithography, Lithography, Metals, Resolution enhancement technologies, Source mask optimization, Manufacturing, Logic, Immersion lithography, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2011 Paper

Custom source and mask optimization for 20nm SRAM and logic

Michael Smayling, Tamer Coskun, Vishnu Kamat

Proceedings Volume 7973, 79731W (2011) https://doi.org/10.1117/12.881662

KEYWORDS: Logic, Source mask optimization, Fiber optic illuminators, Optical lithography, Photomasks, Double patterning technology, Metals, Lithography, Nanoimprint lithography, System on a chip

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Proceedings Article | 23 March 2011 Paper

Accounting for mask topography effects in source-mask optimization for advanced nodes

Tamer Coskun, Huixiong Dai, Hsu-Ting Huang, Vishnu Kamat, Chris Ngai

Proceedings Volume 7973, 79730P (2011) https://doi.org/10.1117/12.879704

KEYWORDS: Photomasks, 3D modeling, Source mask optimization, Data modeling, Semiconducting wafers, Optimization (mathematics), Calibration, Optical proximity correction, Contrast sensitivity, Nanoimprint lithography

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Proceedings Article | 23 September 2009 Paper

Calibration of e-beam and etch models using SEM images

Constantin Chuyeshov, Jesus Carrero, Apo Sezginer, Vishnu Kamat

Proceedings Volume 7488, 74883I (2009) https://doi.org/10.1117/12.833485

KEYWORDS: Scanning electron microscopy, Calibration, Etching, Photomasks, Data modeling, Metrology, Image processing, Plasma etching, Process modeling, Systems modeling

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Proceedings Article | 16 March 2009 Paper

Enabling process window improvement at 45nm and 32nm with free-form DOE illumination

Tamer Coskun, Apo Sezginer, Vishnu Kamat, Michiel Kruger, Bayram Yenikaya, James Carriere, Jared Stack, Marc Himel

Proceedings Volume 7274, 72740B (2009) https://doi.org/10.1117/12.814215

KEYWORDS: Diffractive optical elements, Photomasks, Manufacturing, Nanoimprint lithography, Source mask optimization, SRAF, Lithographic illumination, Model-based design, Image processing, Lithium

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Proceedings Article | 20 October 2006 Paper

PPC model build methodology: sequential litho and etch verification

Ali Mokhberi, Vishnu Kamat, Apo Sezginer, Franz Zach, Gökhan Perçin, Jesus Carrero, Hsu-Ting Huang

Proceedings Volume 6349, 63491Z (2006) https://doi.org/10.1117/12.692931

KEYWORDS: Etching, Calibration, Data modeling, Semiconducting wafers, Particles, Scanning electron microscopy, Chromatic aberrations, Performance modeling, Wafer-level optics, Photomasks

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Proceedings Article | 14 March 2006 Paper

Optimal segmentation of polygon edges

Apo Sezginer, Bayram Yenikaya, Hsu-Ting Huang, Vishnu Kamat, Yung-Tin Chen

Proceedings Volume 6156, 61561G (2006) https://doi.org/10.1117/12.656695

KEYWORDS: Image segmentation, Photomasks, Image processing algorithms and systems, Optical proximity correction, Optimization (mathematics), Tolerancing, Data modeling, Detection and tracking algorithms, Manufacturing, Semiconducting wafers

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Proceedings Article | 14 March 2006 Paper

RET for the wiring layer of a 3D memory

Yung-Tin Chen, Paul Poon, Chris Petti, Vishnu Kamat, Apo Sezginer, Hsu-Ting Huang

Proceedings Volume 6156, 61561E (2006) https://doi.org/10.1117/12.656725

KEYWORDS: Photomasks, Resolution enhancement technologies, Bridges, Scanning electron microscopy, Optical proximity correction, Image segmentation, Array processing, Manufacturing, Solids, Critical dimension metrology

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Proceedings Article | 3 May 2004 Paper

Hybrid AAPSM compliance methodology to ensure design for manufacturing

Vishnu Kamat, Alexander Miloslavsky, Vinod Malhotra, Jeffrey Mayhew, Michel Cote

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.561828

KEYWORDS: Photomasks, Phase shifts, Lithography, Resolution enhancement technologies, Manufacturing, Transistors, Semiconductors, Optical proximity correction, Design for manufacturing, 193nm lithography

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Proceedings Article | 17 December 2003 Paper

A new concept of image imbalance correction for phase-shift mask lithography at 65 nm

Vishnu Kamat, Armen Kroyan

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518165

KEYWORDS: Photomasks, Phase shifts, Manufacturing, Lithography, Semiconducting wafers, 3D image processing, Image quality, Image resolution, Binary data, Scattering

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Proceedings Article | 11 March 2002 Paper

Model-based OPC methodology for 0.13 micron technology

Vishnu Kamat, Kent Green, Sejal Chheda, Sven Muehle, Venkat Kolagunta, Bill Wilkinson, Cecilia Philbin

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458355

KEYWORDS: Optical proximity correction, Reticles, Data modeling, Semiconducting wafers, Manufacturing, Lithography, Databases, Model-based design, Instrument modeling, Optics manufacturing

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Proceedings Article | 8 May 2001 Paper

Bayesian iterative binary filter design

Vishnu Kamat, Edward Dougherty

Proceedings Volume 4304, (2001) https://doi.org/10.1117/12.424975

KEYWORDS: Image processing, Statistical analysis, Error analysis, Image filtering, Binary data, Field emission displays, Image resolution, Statistical modeling, Image analysis, Algorithm development

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Proceedings Article | 27 April 2001 Paper

Real-time large-window binary filter design

Vishnu Kamat, Edward Dougherty

Proceedings Volume 4303, (2001) https://doi.org/10.1117/12.424960

KEYWORDS: Binary data, Error analysis, Statistical analysis, Field emission displays, Image processing, Data storage, Image resolution, Image filtering, Statistical modeling, Image analysis

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SPIE Journal Paper | 1 July 2000

Multiresolution Bayesian design of binary filters

Vishnu Kamat, Edward Dougherty, Junior Barrera

JEI, Vol. 9, Issue 03, (July 2000) https://doi.org/10.1117/12.10.1117/1.482745

KEYWORDS: Image filtering, Error analysis, Optimal filtering, Digital filtering, Image resolution, Statistical analysis, Statistical modeling, Electronic filtering, Image processing, Binary data

Proceedings Article | 22 March 2000 Paper

Expression ratio statistics and its applications to microarray data analysis

Yidong Chen, Vishnu Kamat, Edward Dougherty, Michael Bittner, Paul Meltzer, Jeffrey Trent

Proceedings Volume 3926, (2000) https://doi.org/10.1117/12.380505

KEYWORDS: Signal to noise ratio, Statistical analysis, Data analysis, Target detection, Monte Carlo methods, Glasses, Image segmentation, Signal detection, Image analysis, Biological research

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Proceedings Article | 3 March 2000 Paper

Bayesian multiresolution filter design

Vishnu Kamat, Edward Dougherty, Junior Barrera

Proceedings Volume 3961, (2000) https://doi.org/10.1117/12.379399

KEYWORDS: Error analysis, Image filtering, Statistical analysis, Optimal filtering, Image resolution, Digital filtering, Statistical modeling, Image processing, Binary data, Analog electronics

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SPIE Journal Paper | 1 January 1999

Unsupervised morphological granulometric texture segmentation of digital mammograms

S. Baeg, Sinan Batman, Edward Dougherty, Vishnu Kamat, Nasser Kehtarnavaz, Seungchan Kim, Antony Popov, Krishnamoorthy Sivakumar, Robert Shah

JEI, Vol. 8, Issue 01, (January 1999) https://doi.org/10.1117/12.10.1117/1.482685

KEYWORDS: Image segmentation, Mammography, Image processing, Visualization, Image compression, Binary data, Tissues, Feature selection, Image processing algorithms and systems, Statistical modeling

Showing 5 of 18 publications

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