Mr. Wilhelm Ulrich Profile

Wilhelm Ulrich

Senior Director/Optical Design at Carl Zeiss AG

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 15 October 2005 Paper

Reflective high-NA projection lenses

Hans-Jürgen Mann, Wilhelm Ulrich

Proceedings Volume 5962, 596214 (2005) https://doi.org/10.1117/12.625196

KEYWORDS: Mirrors, Reflectivity, Reflector telescopes, Lenses, Microscopes, Extreme ultraviolet, Relays, Optical design, Lithography, Monochromatic aberrations

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Proceedings Article | 15 October 2005 Paper

Catadioptric projection lenses for immersion lithography

Heiko Feldmann, Aurelian Dodoc, Alexander Epple, Hans-Jürgen Rostalski, David Shafer, Wilhelm Ulrich

Proceedings Volume 5962, 59620Y (2005) https://doi.org/10.1117/12.625199

KEYWORDS: Mirrors, Combined lens-mirror systems, Lenses, Lithography, Refractor telescopes, Immersion lithography, Optical design, Monochromatic aberrations, Beam splitters, Relays

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SPIE Journal Paper | 1 January 2004

Development of dioptric projection lenses for deep ultraviolet lithography at Carl Zeiss

Wilhelm Ulrich, Hans Rostalski, Russell Hudyma

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1637592

KEYWORDS: Lenses, Refractor telescopes, Lithography, Deep ultraviolet, Objectives, Lens design, Ultraviolet radiation, Microscopes, Semiconducting wafers, Wavefronts

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Proceedings Article | 23 December 2002 Paper

Development of dioptric projection lenses for DUV lithography

Wilhelm Ulrich, Hans-Juergen Rostalski, Russell Hudyma

Proceedings Volume 4832, (2002) https://doi.org/10.1117/12.486477

KEYWORDS: Lenses, Refractor telescopes, Lithography, Deep ultraviolet, Objectives, Projection lithography, Optical lithography, Logic, Application specific integrated circuits, Ultraviolet lenses

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Proceedings Article | 8 November 2000 Paper

Trends in optical design of projection lenses for UV and EUV lithography

Wilhelm Ulrich, Susanne Beiersdoerfer, Hans-Juergen Mann

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406667

KEYWORDS: Mirrors, Combined lens-mirror systems, Lenses, Beam splitters, Lens design, Patents, Optical design, Lithography, Deep ultraviolet, Aspheric lenses

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Proceedings Article | 17 May 1994 Paper

New mask evaluation tool: the microlithography simulation microscope aerial image measurement system

Russell Budd, Derek Dove, John Staples, H. Nasse, Wilhelm Ulrich

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175448

KEYWORDS: Photomasks, Microscopes, Image analysis, Objectives, Deep ultraviolet, Optical lithography, CCD cameras, Etching, Reticles, Computer simulations

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