Ms. Ying Chen Profile

Ying Chen

Student at Institute of Microelectronics

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Author

Publications (7)

SPIE Journal Paper | 22 November 2021

Hotspot detection in large-scale layout with proposal sampling and feature parameters optimization

Tianyang Gai, Ying Chen, Xiaojing Su, Tong Qu, Shuhan Wang, Yajuan Su, Yayi Wei

JM3, Vol. 20, Issue 04, 041208, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041208

KEYWORDS: Feature extraction, Sensors, Lithography, Data modeling, Convolution, Performance modeling, Neural networks, Visualization, Machine learning, Image processing

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SPIE Journal Paper | 18 November 2019

SoulNet: ultrafast optical source optimization utilizing generative neural networks for advanced lithography

Ying Chen, Yibo Lin, Lisong Dong, Tianyang Gai, Rui Chen, Yajuan Su, Yayi Wei, David Pan

JM3, Vol. 18, Issue 04, 043506, (November 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.4.043506

KEYWORDS: Lithography, Model-based design, Optimization (mathematics), Neural networks, Data modeling, Machine learning, Photomasks, Mathematical modeling, Ultrafast phenomena, Source mask optimization

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Proceedings Article | 20 March 2019 Paper

Sample patterns extraction from layout automatically based on hierarchical cluster algorithm for lithography process optimization

Tianyang Gai, Ying Chen, Pengzheng Gao, Xiaojing Su, Lisong Dong, Yajuan Su, Yayi Wei, Tianchun Ye

Proceedings Volume 10962, 109620X (2019) https://doi.org/10.1117/12.2514177

KEYWORDS: Feature extraction, Lithography, Optimization (mathematics), Photomasks, Optical proximity correction, Source mask optimization, Machine learning

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Proceedings Article | 20 March 2018 Paper

Hybrid hotspot library building based on optical and geometry analysis at early stage for new node development

Ying Chen, Tianyang Gai, Xiaojing Su, Yayi Wei, Yajuan Su, Tianchun Ye

Proceedings Volume 10588, 1058811 (2018) https://doi.org/10.1117/12.2296834

KEYWORDS: Lithography, Image processing, Double patterning technology, Computer simulations, Optics manufacturing, Microelectronics, New and emerging technologies, Image analysis, Data processing, Image quality

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Proceedings Article | 4 April 2017 Paper

Enhancing manufacturability of standard cells by using DTCO methodology

Lijun Zhao, Ying Chen, Xiaojing Su, Yajuan Su, Yayi Wei, Tianchun Ye

Proceedings Volume 10148, 101481G (2017) https://doi.org/10.1117/12.2263178

KEYWORDS: Lithography, Source mask optimization, Manufacturing, Optical lithography, Photomasks, 193nm lithography, Immersion lithography, Logic, Double patterning technology, Microelectronics, Metals

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Proceedings Article | 28 March 2017 Paper

Hotspots fixing flow in NTD process by using DTCO methodology at 10nm metal 1 layer

Xiaojing Su, Lisong Dong, Jiaxin Lin, Ying Chen, Yayi Wei, Tianchun Ye, Chunshan Du, Feng Shao, Recco Zhang, Yu Zhu, Junjiang Lei, Minghui Fan

Proceedings Volume 10148, 1014817 (2017) https://doi.org/10.1117/12.2257786

KEYWORDS: Electroluminescence, Photovoltaics, Solar cells, Optimization (mathematics), Resolution enhancement technologies, Image processing, Molybdenum, Photomasks, Metals, Optical lithography, Lithography, Process modeling, Source mask optimization, Lead

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Proceedings Article | 16 March 2016 Paper

Design technology co-optimization for 14/10nm metal1 double patterning layer

Yingli Duan, Xiaojing Su, Ying Chen, Yajuan Su, Feng Shao, Recco Zhang, Junjiang Lei, Yayi Wei

Proceedings Volume 9781, 97810X (2016) https://doi.org/10.1117/12.2218711

KEYWORDS: Manufacturing, Double patterning technology, Lithography, Analytical research, Algorithm development, Optical proximity correction, New and emerging technologies, Optical lithography, Optimization (mathematics), Immersion lithography, Source mask optimization, Design for manufacturing, Metals, Photomasks

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Showing 5 of 7 publications

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