Mr. Yingchun Zhang Profile

Yingchun Zhang

at Semiconductor Manufacturing International Corp.

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Publications (1)

Proceedings Article | 26 May 2022 Paper

Etch proximity correction for dense array patterns

Jian Wang, Sainan Yao, Yingchun Zhang

Proceedings Volume 12052, 120521B (2022) https://doi.org/10.1117/12.2610743

KEYWORDS: Etching, Data modeling, Critical dimension metrology, Plasma etching, Optical proximity correction, Optical lithography, Inspection, Design for manufacturability, Calibration, Semiconductor manufacturing

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