Mr. Yoav Grauer Profile

Yoav Grauer

Product Marketing Manager at KLA Israel

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 10 April 2024 Presentation + Paper

Presentation + Paper

Advanced processing control for wafer-to-wafer hybrid bonding

Nikhil Aditya Kumar Roy, Richard Housley, Dan Engelhard, Hao Wang, Cassie Bayless, Chris Nguyen, Franz Zach, Shubham Badjate, Abhishek Gottipati, Yoav Grauer, Oren Ben-Nun, Roie Volkovich

Proceedings Volume 12955, 129551Q (2024) https://doi.org/10.1117/12.3010036

KEYWORDS: Wafer bonding, Overlay metrology, Semiconducting wafers, Process control, Metrology, 3D metrology, Optical parametric oscillators, Advanced process control, 3D acquisition, Distortion

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Proceedings Article | 10 April 2024 Presentation + Paper

Presentation + Paper

Small pitch overlay imaging metrology targets for tight OPO control

Nikhil Aditya Kumar Roy, Richard Housley, Suresh Kumar, Ranga Reddy, Dan Engelhard, Hao Wang, Atsushi Miyafuji, Toshiharu Nishiyama, Yoel Feler, Diana Shaphirov, Mark Ghinovker, Ido Ashuah, Yoav Grauer, Yonglei Li

Proceedings Volume 12955, 129551V (2024) https://doi.org/10.1117/12.3009769

KEYWORDS: Overlay metrology, Semiconducting wafers, Light sources and illumination, Metrology, Imaging metrology

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Proceedings Article | 10 April 2024 Poster + Paper

Poster + Paper

Artificial intelligence measurement in imaging-based overlay metrology for performance boost

Sveta Grechin, Shlomit Katz, Kei Maeda, Tsumugi Hirasawa, Hisashi Otsubo, Seigo Aoki, Atsushi Takahashi, Atsushi Miyafuji, Ofer Manos, Yu Yang, Tal Levinson, Ran Trifon, Dor Yehuda, Hamode Hagaze, Yuval Lamhot, Yair Vardi, Yoav Grauer, Avner Safrani, Cindy Kato, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, Hayashi Masanobu, Eunjoong An, Nana Lan, Simon Ahn, Nadav Gutman

Proceedings Volume 12955, 129552P (2024) https://doi.org/10.1117/12.3010281

KEYWORDS: Overlay metrology, Artificial intelligence, Semiconducting wafers, Education and training, Metrology, Evolutionary algorithms, Detection and tracking algorithms, Target acquisition, Performance modeling, Optical parametric oscillators

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Proceedings Article | 27 April 2023 Poster + Paper

Poster + Paper

Advanced overlay metrology for 3D NAND bonding applications

Yoav Grauer, Shlomo Eisenbach, Motti Penia, Dror Elka, Arkady Simkin, Avner Safrani, Efi Megged

Proceedings Volume 12496, 124963D (2023) https://doi.org/10.1117/12.2660026

KEYWORDS: Wafer bonding, Semiconducting wafers, Metrology, 3D metrology, Optical parametric oscillators, Silicon, Optical alignment, Photovoltaics, Overlay metrology, Copper

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Proceedings Article | 27 April 2023 Presentation + Paper

Presentation + Paper

OPO improvements by Moiré effect-based imaging

Yonglei Li, Justin Lim, Nahee Park, Yuqian Zhang, Xiaolei Liu, Yasutaka Okada, Gloria Chen, Ben McClain, Erin Hollinger, Amy Weatherly, Yoav Grauer, Zephyr Liu, Raviv Yohanan, Greg Gray, Mark Stakely, Shlomit Katz, Mahendra Dubey, Neeraj Khanna

Proceedings Volume 12496, 124960R (2023) https://doi.org/10.1117/12.2658074

KEYWORDS: Design and modelling, Metrology, Overlay metrology, Process control, Inspection, Optical lithography, Imaging metrology, Semiconductors, Moire patterns

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Proceedings Article | 27 April 2023 Poster + Presentation + Paper

Poster + Presentation + Paper

OPO robustness and measurability improvement via extended wavelengths

Shlomit Katz, Nikhil Aditya Kumar Roy, Steve McCandless, Jason Reece, Nathan Gillespie, Nils Monserud, Yoav Grauer, Mark Stakely, Greg Gray, Yonglei Li, Peter Kimani, Nahee Park, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, Yuqian Zhang

Proceedings Volume 12496, 1249613 (2023) https://doi.org/10.1117/12.2655161

KEYWORDS: Near infrared, Opacity, Metrology, 3D metrology, Photoresist processing, Overlay metrology, Image processing, Etching, Optical gratings

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Proceedings Article | 26 May 2022 Paper

Paper

Overlay challenges in 3D heterogeneous integration

Yoav Grauer, Andy Miller, Douglas Charles La Tulipe, Amnon Manassen, Shlomo Eisenbach, Ohad Bachar, Roel Gronheid

Proceedings Volume 12053, 120530D (2022) https://doi.org/10.1117/12.2608319

KEYWORDS: Semiconducting wafers, Metrology, Wafer bonding, Silicon, 3D metrology, Packaging, Optical alignment

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Proceedings Article | 26 May 2022 Poster + Paper

Poster + Paper

Process optimization by virtual target design in overlay metrology

Xiaolei Liu, Yoav Grauer, Raviv Yohanan, Mark Ghinovker, Diana Shaphirov, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, Xindong Gao

Proceedings Volume 12053, 1205322 (2022) https://doi.org/10.1117/12.2614129

KEYWORDS: Metrology, Overlay metrology, Semiconducting wafers, Tolerancing, Device simulation, Calibration, Photomasks, Virtual reality, Opacity, Roads

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Proceedings Article | 26 May 2022 Presentation + Paper

Presentation + Paper

Optical overlay metrology trends in advanced nodes

Shlomit Katz, Yoav Grauer, Efi Megged

Proceedings Volume 12053, 120530N (2022) https://doi.org/10.1117/12.2605863

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, 3D metrology, Semiconductors, Opacity, Optical parametric oscillators, Infrared imaging, 3D acquisition, Photoresist processing

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Proceedings Article | 22 February 2021 Presentation + Paper

Presentation + Paper

High voltage scanning electron microscope overlay metrology accuracy for after development inspection

S. Czerkas, N. Gutman, R. Gronheid, E. Gurevich, R. Wang, Y. Feler, M. Zaberchik, Y. Grauer, H. Stoschus, Y. Uziel, U. Pohlmann, F. Laske

Proceedings Volume 11611, 116110B (2021) https://doi.org/10.1117/12.2583710

KEYWORDS: Overlay metrology, Scanning electron microscopy, Inspection, Electron microscopes, Optical metrology, Optical lithography, New and emerging technologies, Metrology, Integrated optics, Imaging metrology

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Poster + Presentation + Paper

Accuracy enhancement in imaging-based overlay metrology by optimizing measurement conditions per layer

Shlomit Katz, Yoav Grauer, Raviv Yohanan, Xiaolei Liu, Daria Negri, Anna Golotsvan

Proceedings Volume 11611, 116112O (2021) https://doi.org/10.1117/12.2583615

KEYWORDS: Overlay metrology, Computer simulations

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Poster + Presentation + Paper

Robustness improvement in imaging-based overlay metrology for high topography layers by Talbot targets

Brian Watson, Shlomit Katz, Richard Housley, Kar Wui Thong, Nikhil Aditya Kumar Roy, Yoav Grauer, Diana Shapirov, Raviv Yohanan, Greg Gray, Yonglei Li, Daniel Chalom

Proceedings Volume 11611, 1161133 (2021) https://doi.org/10.1117/12.2583831

KEYWORDS: Metrology, Optical parametric oscillators, Overlay metrology, Imaging metrology, 3D metrology, 3D acquisition

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Proceedings Article | 20 March 2020 Paper

Paper

OPO residuals improvement with imaging metrology for 3D NAND

Shlomit Katz, Anna Golotsvan, Yoav Grauer, Efi Megged, Greg Gray, Fiona (Shuk Fan) Leung, Pek Beng Ong, Shi Lei, Jeremy (Shi-Ming) Wei, Wayne (Wei) Zhou, Linfei Gao

Proceedings Volume 11325, 113252J (2020) https://doi.org/10.1117/12.2551874

KEYWORDS: Overlay metrology, Semiconducting wafers, 3D acquisition, 3D image processing, Imaging metrology, Scanning electron microscopy, Optimization (mathematics), Photovoltaics

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Proceedings Article | 20 March 2020 Paper

Paper

Machine learning for Tool Induced Shift (TIS) reduction

Shlomit Katz, Boaz Ophir, Udi Shusterman, Anna Golotsvan, Liran Yerushalmi, Efi Megged, Yoav Grauer, Jian Zhang, Alimei Shih, Shi-Ming Wei, Judith Yep, Fiona (Shuk Fan) Leung, Pek Beng Ong

Proceedings Volume 11325, 113252C (2020) https://doi.org/10.1117/12.2550747

KEYWORDS: Semiconducting wafers, Overlay metrology, Machine learning, Metrology, Data modeling, 3D modeling, Performance modeling

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Proceedings Article | 20 March 2020 Paper

Paper

OPO reduction by novel target design

Zephyr Liu, Eitan Hajaj, Ira Naot, Raviv Yohanan, Yoav Grauer

Proceedings Volume 11325, 113252S (2020) https://doi.org/10.1117/12.2552000

KEYWORDS: Metrology, Optical parametric oscillators, Optical design, Overlay metrology, 3D acquisition, 3D metrology, Integrated circuits, Manufacturing, Logic, Process control

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Proceedings Article | 20 March 2020 Paper

Paper

Improved device overlay by litho aberration tracking with novel target design for DRAM

Xiaolei Liu, Eitan Hajaj, Alon Volfman, Hedvi Spielberg, Yoav Grauer, Raviv Yohanan, Xindong Gao

Proceedings Volume 11325, 113252R (2020) https://doi.org/10.1117/12.2551990

KEYWORDS: Overlay metrology, Lithographic illumination, Optical proximity correction, Diffraction gratings

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Proceedings Article | 20 March 2020 Presentation + Paper

Presentation + Paper

On product overlay metrology challenges in advanced nodes

Andrei Shchegrov, Philippe Leray, Yuri Paskover, Liran Yerushalmi, Efi Megged, Yoav Grauer, Roel Gronheid

Proceedings Volume 11325, 113251P (2020) https://doi.org/10.1117/12.2551932

KEYWORDS: Optical parametric oscillators, Metrology, Overlay metrology, Logic, Optical alignment, Semiconducting wafers, 3D metrology, Polarization, Extreme ultraviolet, Etching

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Proceedings Article | 21 October 2016 Presentation + Paper

Presentation + Paper

RGB-NIR active gated imaging

Nick Spooren, Bert Geelen, Klaas Tack, Andy Lambrechts, Murali Jayapala, Ran Ginat, Yaara David, Eyal Levi, Yoav Grauer

Proceedings Volume 9987, 998704 (2016) https://doi.org/10.1117/12.2239603

KEYWORDS: Near infrared, Image processing, Vertical cavity surface emitting lasers, Sensors, Optical filters, RGB color model, Objectives, Image fusion, Cameras, Semiconducting wafers

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Proceedings Article | 4 March 2015 Paper

Paper

Active gated imaging for automotive safety applications

Yoav Grauer, Ezri Sonn

Proceedings Volume 9407, 94070F (2015) https://doi.org/10.1117/12.2078169

KEYWORDS: Imaging systems, Image sensors, Near infrared, Sensors, Cameras, Fiber optic illuminators, Gated imaging, Safety, Night vision, Control systems

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Showing 5 of 19 publications

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