Dr. Yongan Xu Profile

Dr. Yongan Xu

Director, Physicist/Scientist, AR/VR at Applied Materials

SPIE Involvement:

Conference Program Committee | Author

Publications (21)

Proceedings Article | 22 November 2023 Presentation

Lithography challenges in high quality surface relief gratings for augmented reality application

Yongan Xu

Proceedings Volume PC12751, PC127510A (2023) https://doi.org/10.1117/12.2688530

KEYWORDS: Augmented reality, Lithography, Manufacturing, Industrial applications, Waveguides, Optical lithography, Optical proximity correction, Glasses, Semiconductors, Photomasks

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SPIE Journal Paper | 31 July 2018

Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning

Angélique Raley, Joe Lee, Jeffrey Smith, Xinghua Sun, Richard Farrell, Jeffrey Shearer, Yongan Xu, Akiteru Ko, Andrew Metz, Peter Biolsi, Anton Devilliers, John Arnold, Nelson Felix

JM3, Vol. 18, Issue 01, 011002, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011002

KEYWORDS: Etching, Extreme ultraviolet, Line edge roughness, Optical lithography, Line width roughness, Silicon, Double patterning technology, Dielectrics, Metals, System on a chip

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Proceedings Article | 9 April 2018 Presentation + Paper

Polymer brush as adhesion promoter for EUV patterning

Jing Guo, Anuja De Silva, Yann Mignot, Yongan Xu, Abraham Arceo de la Pena, Luciana Meli, Indira Seshadri, Dominik Metzler, Lovejeet Singh, Tsuyoshi Furukawa, Ramakrishnan Ayothi, Nelson Felix, Dan Corliss

Proceedings Volume 10586, 105860I (2018) https://doi.org/10.1117/12.2297113

KEYWORDS: Chemistry, Polymers, Printing, Etching, Optical lithography, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Dielectrics, Semiconducting wafers

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Proceedings Article | 4 April 2018 Paper

Self-aligned blocking integration demonstration for critical sub-30nm pitch Mx level patterning with EUV self-aligned double patterning

Angélique Raley, Joe Lee, Jeffrey Smith, Xinghua Sun, Richard Farrell, Jeffrey Shearer, Yongan Xu, Akiteru Ko, Andrew Metz, Peter Biolsi, Anton Devilliers, John Arnold, Nelson Felix

Proceedings Volume 10589, 105890L (2018) https://doi.org/10.1117/12.2297438

KEYWORDS: Etching, Extreme ultraviolet, Line edge roughness, Image processing, Optical lithography, Dielectrics, Silicon, Metals, Line width roughness, Double patterning technology

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Proceedings Article | 16 October 2017 Presentation + Paper

Development of amorphous silicon based EUV hardmasks through physical vapor deposition

Anuja De Silva, Yann Mignot, Luciana Meli, Scott DeVries, Yongan Xu, Indira Seshadri, Nelson Felix, Wilson Zeng, Yong Cao, Khoi Phan, Huixiong Dai, Christopher Ngai, Michael Stolfi, Daniel Diehl

Proceedings Volume 10450, 104501A (2017) https://doi.org/10.1117/12.2280607

KEYWORDS: Amorphous silicon, Optical lithography, Etching, Photoresist materials, Silicon, Head-mounted displays, Silicon films, Chemical vapor deposition, Extreme ultraviolet, Physical vapor deposition

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Proceedings Article | 16 October 2017 Paper

Coater/developer based techniques to improve high-resolution EUV patterning defectivity

Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Akiteru Ko, Shinichiro Kawakami, Takeshi Shimoaoki, Yusaku Hashimoto, Koichiro Tanaka, Karen Petrillo, Luciana Meli, Anuja De Silva, Yongan Xu, Nelson Felix, Richard Johnson, Cody Murray, Alex Hubbard

Proceedings Volume 10450, 104501U (2017) https://doi.org/10.1117/12.2280506

KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Line width roughness, Coating, Manufacturing, Contamination

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Proceedings Article | 13 April 2017 Presentation + Paper

Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle

Cheng Chi, Chi-Chun Liu, Luciana Meli, Jing Guo, Doni Parnell, Yann Mignot, Kristin Schmidt, Martha Sanchez, Richard Farrell, Lovejeet Singh, Tsuyoshi Furukawa, Kafai Lai, Yongan Xu, Daniel Sanders, David Hetzer, Andrew Metz, Sean Burns, Nelson Felix, John Arnold, Daniel Corliss

Proceedings Volume 10146, 101460Q (2017) https://doi.org/10.1117/12.2260454

KEYWORDS: Etching, Directed self assembly, Polymethylmethacrylate, Critical dimension metrology, Picosecond phenomena, Oxides, Scanning electron microscopy, Optical lithography, Extreme ultraviolet, Metals

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SPIE Journal Paper | 7 February 2017

Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?

Kafai Lai, Chi-Chun Liu, Hsinyu Tsai, Yongan Xu, Cheng Chi, Ananthan Raghunathan, Parul Dhagat, Lin Hu, Oseo Park, Sunggon Jung, Wooyong Cho, Jaime Morillo, Jed Pitera, Kristin Schmidt, Mike Guillorn, Markus Brink, Daniel Sanders, Nelson Felix, Todd Bailey, Matthew Colburn

JM3, Vol. 16, Issue 01, 013502, (February 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.1.013502

KEYWORDS: Directed self assembly, Resolution enhancement technologies, Lithography, Metals, Optical lithography, Photomasks, 3D modeling, Computational lithography, Optical proximity correction

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Proceedings Article | 10 May 2016 Paper

Development of a new high transmission phase shift mask technology for 10 nm logic node

Thomas Faure, Yoshifumi Sakamoto, Yusuke Toda, Karen Badger, Kazunori Seki, Mark Lawliss, Takeshi Isogawa, Amy Zweber, Masayuki Kagawa, Richard Wistrom, Yongan Xu, Granger Lobb, Ramya Viswanathan, Lin Hu, Yukio Inazuki, Kazuhiro Nishikawa

Proceedings Volume 9984, 998402 (2016) https://doi.org/10.1117/12.2241480

KEYWORDS: Photomasks, Phase shifts, Logic, Lithography, Chromium, Inspection, Opacity, SRAF, Etching, Attenuators

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Proceedings Article | 4 April 2016 Paper

DSA via hole shrink for advanced node applications

Cheng Chi, Chi-Chun Liu, Luciana Meli, Kristin Schmidt, Yongan Xu, Ekmini Anuja DeSilva, Martha Sanchez, Richard Farrell, Hongyun Cottle, Daiji Kawamura, Lovejeet Singh, Tsuyoshi Furukawa, Kafai Lai, Jed Pitera, Daniel Sanders, David Hetzer, Andrew Metz, Nelson Felix, John Arnold, Matthew Colburn

Proceedings Volume 9777, 97770L (2016) https://doi.org/10.1117/12.2219706

KEYWORDS: Directed self assembly, Polymethylmethacrylate, Picosecond phenomena, Etching, Global Positioning System, Critical dimension metrology, Optical lithography, Lithography, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 1 April 2016 Paper

Lithographic qualification of high-transmission mask blank for 10nm node and beyond

Yongan Xu, Tom Faure, Ramya Viswanathan, Granger Lobb, Richard Wistrom, Sean Burns, Lin Hu, Ioana Graur, Ben Bleiman, Dan Fischer, Yann Mignot, Yoshifumi Sakamoto, Yusuke Toda, John Bolton, Todd Bailey, Nelson Felix, John Arnold, Matthew Colburn

Proceedings Volume 9780, 978006 (2016) https://doi.org/10.1117/12.2219778

KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Transmittance, Resolution enhancement technologies, Printing, SRAF, Critical dimension metrology, Phase shifts

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Proceedings Article | 18 March 2016 Paper

Comparison of left and right side line edge roughness in lithography

Lei Sun, Nicole Saulnier, Genevieve Beique, Erik Verduijn, Wenhui Wang, Yongan Xu, Hao Tang, Yulu Chen, Ryoung-han Kim, John Arnold, Nelson Felix, Matthew Colburn

Proceedings Volume 9778, 977822 (2016) https://doi.org/10.1117/12.2219665

KEYWORDS: Line edge roughness, Metrology, Lithography, Etching, Semiconductors, Scattering, Inspection, Critical dimension metrology, Photomasks, Roads, Extreme ultraviolet lithography

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Proceedings Article | 18 March 2016 Paper

EUV patterning successes and frontiers

Nelson Felix, Dan Corliss, Karen Petrillo, Nicole Saulnier, Yongan Xu, Luciana Meli, Hao Tang, Anuja De Silva, Bassem Hamieh, Martin Burkhardt, Yann Mignot, Richard Johnson, Chris Robinson, Mary Breton, Indira Seshadri, Derren Dunn, Stuart Sieg, Eric Miller, Genevieve Beique, Andre Labonte, Lei Sun, Geng Han, Erik Verduijn, Eunshoo Han, Bong Cheol Kim, Jongsu Kim, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Shinichiro Kawakami, Koichi Matsunaga

Proceedings Volume 9776, 97761O (2016) https://doi.org/10.1117/12.2219894

KEYWORDS: Extreme ultraviolet, Optical lithography, Lithography, Extreme ultraviolet lithography, Oxides, Neodymium, Ions, Etching

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Proceedings Article | 15 March 2016 Paper

Ultimate 2D resolution printing with negative tone development

Martin Burkhardt, Yongan Xu, Hsinyu Tsai, Alexander Tritchkov, Jörg Mellmann

Proceedings Volume 9780, 97800E (2016) https://doi.org/10.1117/12.2219765

KEYWORDS: Deep ultraviolet, Pixel resolution, Photomasks, Image processing, Printing, Extreme ultraviolet, Resolution enhancement technologies, Image resolution, Photoresist processing, Optical lithography, Lithography, Fiber optic illuminators, Optical proximity correction, Photovoltaics, Extreme ultraviolet lithography

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Proceedings Article | 16 March 2015 Paper

Directed self assembly on resist-limited guiding patterns for hole grapho-epitaxy: Can DSA help lower EUV's source power requirements?

J. Torres, Fan Jiang, Yuansheng Ma, Joerg Mellman, Kafai Lai, Ananthan Raghunathan, Yongan Xu, Chi-Chun Liu, Cheng Chi

Proceedings Volume 9422, 94220W (2015) https://doi.org/10.1117/12.2085959

KEYWORDS: Line edge roughness, Extreme ultraviolet, Polymethylmethacrylate, Picosecond phenomena, Lithography, Polymers, Directed self assembly, Monte Carlo methods, Visualization, Extreme ultraviolet lithography

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Proceedings Article | 13 March 2015 Paper

EUV processing and characterization for BEOL

Nicole Saulnier, Yongan Xu, Wenhui Wang, Lei Sun, Lin Lee Cheong, Romain Lallement, Genevieve Beique, Bassem Hamieh, John Arnold, Nelson Felix, Matthew Colburn

Proceedings Volume 9422, 94220T (2015) https://doi.org/10.1117/12.2086126

KEYWORDS: Semiconducting wafers, Etching, Line edge roughness, Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Scanning electron microscopy, Lithography, Scanners

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Proceedings Article | 20 March 2012 Paper

Assessment of negative tone development challenges

Sohan Mehta, Yongan Xu, Guillaume Landie, Vikrant Chauhan, Sean Burns, Peggy Lawson, Bassem Hamieh, Jerome Wandell, Martin Glodde, Yu Yang Sun, Mark Kelling, Alan Thomas, Jeong Soo Kim, James Chen, Hirokazu Kato, Chiahsun Tseng, Chiew-Seng Koay, Yoshinori Matsui, Martin Burkhardt, Yunpeng Yin, David Horak, Shyng-Tsong Chen, Yann Mignot, Yannick Loquet, Matthew Colburn, John Arnold, Terry Spooner, Lior Huli, Dave Hetzer, Jason Cantone, Shinichiro Kawakami, Shannon Dunn

Proceedings Volume 8325, 832506 (2012) https://doi.org/10.1117/12.917560

KEYWORDS: Semiconducting wafers, Polymers, Optical proximity correction, Reactive ion etching, Etching, Scanning electron microscopy, Neodymium, Photoresist developing, Image processing, Roads

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Proceedings Article | 16 April 2011 Paper

Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond)

Guillaume Landie, Yongan Xu, Sean Burns, Kenji Yoshimoto, Martin Burkhardt, Larry Zhuang, Karen Petrillo, Jason Meiring, Dario Goldfarb, Martin Glodde, Anthony Scaduto, Matthew Colburn, Jason Desisto, Young Bae, Michael Reilly, Cecily Andes, Vaishali Vohra

Proceedings Volume 7972, 797206 (2011) https://doi.org/10.1117/12.882843

KEYWORDS: Photoresist developing, Photoresist materials, Polymers, Systems modeling, Semiconducting wafers, Optical lithography, Optical proximity correction, Photomasks, Etching, Nanoimprint lithography

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Proceedings Article | 16 April 2011 Paper

Negative-tone imaging (NTI) at the 22nm node: process and material development

Jason Cantone, Karen Petrillo, Yongan Xu, Guillaume Landie, Shinichiro Kawakami, Shannon Dunn, Matt Colburn

Proceedings Volume 7972, 79720M (2011) https://doi.org/10.1117/12.879719

KEYWORDS: Image processing, Photoresist developing, Semiconducting wafers, Photoresist materials, Standards development, Scanning electron microscopy, Lithography, Thin film coatings, Reticles, Materials processing

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Proceedings Article | 14 February 2009 Paper

Fabrication of 3D high index photonic crystals by holographic lithography and their fidelity

Xuelian Zhu, Yongan Xu, Shu Yang

Proceedings Volume 7223, 72230A (2009) https://doi.org/10.1117/12.816979

KEYWORDS: Photonic crystals, Polymers, Silicon, Lithography, Refraction, Holography, Silica, Distortion, Photoresist materials, Crystals

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Proceedings Article | 6 February 2007 Paper

Core-shell diamond-like silicon photonic crystals from 3D polymer templates created by holographic lithography

Jun Hyuk Moon, Yongan Xu, Wenting Dong, Seung-Man Yang, Joseph Perry, Ali Adibi, Shu Yang

Proceedings Volume 6480, 64800P (2007) https://doi.org/10.1117/12.701168

KEYWORDS: Silica, Photonic crystals, Polymers, Silicon, Crystals, Holography, Scanning electron microscopy, Lithography, Silicon photonics, Chemical vapor deposition

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Showing 5 of 21 publications

Conference Committee Involvement (4)

Photomask Technology 2025

21 September 2025 | Monterey, California, United States

Photomask Technology 2024

30 September 2024 | Monterey, California, United States

Photomask Technology 2023

2 October 2023 | Monterey, California, United States

Photomask Technology 2022

26 September 2022 | Monterey, California, United States

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