Dr. Yoshiyuki Utsumi Profile

Dr. Yoshiyuki Utsumi

at Tokyo Ohka Kogyo Co Ltd

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 19 March 2018 Paper

A study on enhancing EUV resist sensitivity (2)

Atsushi Sekiguchi, Yoko Matsumoto, Mariko Isono, Michiya Naito, Yoshiyuki Utsumi, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 10583, 1058320 (2018) https://doi.org/10.1117/12.2294598

KEYWORDS: Extreme ultraviolet, Metals, Absorption, Extreme ultraviolet lithography, Polymers, Tin, Tellurium, Diffusion, Prototyping, Transmittance

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Proceedings Article | 26 October 2017 Paper

A study on enhancing EUV resist sensitivity (2)

Atsushi Sekiguchi, Yoko Matsumoto, Michiya Naito, Yoshiyuki Utsumi, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 10450, 104501E (2017) https://doi.org/10.1117/12.2280377

KEYWORDS: Metals, Extreme ultraviolet, Absorption, Extreme ultraviolet lithography, Polymers, Tin, Tellurium, Diffusion, Prototyping, Transmittance

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Proceedings Article | 17 April 2014 Paper

Electron and hole transfer in anion-bound chemically amplified resists used in extreme ultraviolet lithography

Yoshitaka Komuro, Hiroki Yamamoto, Yoshiyuki Utsumi, Katsumi Ohmori, Takahiro Kozawa

Proceedings Volume 9048, 90481F (2014) https://doi.org/10.1117/12.2046627

KEYWORDS: Polymers, Chemically amplified resists, Extreme ultraviolet lithography, Absorption, Diffusion, Extreme ultraviolet, Ionization, Line edge roughness, Electron beams, Matrices

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Proceedings Article | 28 March 2014 Paper

Guided self-assembly of Si-containing block copolymer with a topcoat surface treatment

Takehiro Seshimo, Yoshiyuki Utsumi, Takahiro Dazai, Takaya Maehashi, Katsumi Ohmori

Proceedings Volume 9049, 90490X (2014) https://doi.org/10.1117/12.2046270

KEYWORDS: Silicon, Etching, Optical lithography, Annealing, Polymers, Coating, Lithography, Resistance, Polymerization, Directed self assembly

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Proceedings Article | 23 March 2012 Paper

Out-of-band insensitive polymer-bound PAG for EUV resist

Jun Iwashita, Taku Hirayama, Kensuke Matsuzawa, Yoshiyuki Utsumi, Katsumi Ohmori

Proceedings Volume 8322, 83220Y (2012) https://doi.org/10.1117/12.916355

KEYWORDS: Extreme ultraviolet, Deep ultraviolet, Absorption, Polymers, Extreme ultraviolet lithography, Lithography, Semiconducting wafers, Line width roughness, Diffusion, Lithographic illumination

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Proceedings Article | 1 April 2009 Paper

A study of the photo acid generator material design for chemically amplified photoresists

Y. Utsumi, T. Seshimo, Y. Komuro, A. Kawaue, K. Ishiduka, K. Matsuzawa, Hideo Hada, J. Onodera

Proceedings Volume 7273, 72732F (2009) https://doi.org/10.1117/12.815190

KEYWORDS: Diffusion, Lithography, Polymers, Semiconducting wafers, Molecular interactions, Photoresist materials, Sensors, Hydrogen, Silicon, Chemically amplified resists

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Proceedings Article | 11 April 2006 Paper

Progress of topcoat and resist development for 193nm immersion lithography

Katsumi Ohmori, Tomoyuki Ando, Toshikazu Takayama, Keita Ishizuka, Masaki Yoshida, Yoshiyuki Utsumi, Kotaro Endo, Takeshi Iwai

Proceedings Volume 6153, 61531X (2006) https://doi.org/10.1117/12.656360

KEYWORDS: Polymers, Immersion lithography, Semiconducting wafers, Photoresist processing, Lithography, Silicon, Scanners, Coating, Manufacturing, 193nm lithography

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Showing 5 of 7 publications

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