In recent years, micro-columnar cesium iodide (CsI) scintillation films remain a highly desirable sensor for digital X-ray imaging due to its superior spatial resolution, bright emission, high absorption efficiency and ready availability. The micro-columnar structure of the CsI scintillation films can reduce the lateral diffusion of scintillation light and greatly constrain the transmission behavior of fluorescence. However, CsI scintillation films exposed to humid air are easily deliquescent and damaged. In this paper, the preparation methods and anti-deliquescence measures of CsI scintillation films in recent years are mainly summarized and their respective characteristics and limitations are also comprehensively compared and analyzed, which can provide a reference for the preparation and application of high-performance CsI columnar microcrystalline scintillation films in the future.
The stock removal uniformity in planetary double-sided polishing process has an important influence on the optical materials surface quality. The velocity equation is set up through the kinematical analysis of double-sided polishing process, which refers to any point of the workpieces relative to the pad, and then a quantitative evaluation method of stock removal uniformity is simulated, and finally the optimal parameters of stock removal uniformity are obtained. As the results shown, when the radius ratio between the sun gear and ring gear is equal or greater than 0.2, the parameters m and n fit the equation: n=2.33m-0.06, the optimal stock removal uniformity is obtained.
In order to optimize the surface flatness and roughness of borosilicate glass, this study employs the chemical mechanical polishing technology(CMP) for the surface flattening of borosilicate glass. The polishing characteristics of the sample has been studied by adjusting the process parameters of CMP, including the polishing time, the rotate speed of polishing disk, the rate of polishing liquid flow, and the polishing pressure. And finally, the surface flattening treatment of the sample was realized in the study. The results show that when the process parameters varied, the surface peak-valley value and surface roughness value of the glass shared the similar trend. As the polishing time increased, they decreased rapidly and then gradually stabilized. During the increase of the rotate speed of polishing disk, the rate of polishing liquid flow, and the polishing pressure, they showed a trend of firstly decreasing and then increasing.
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