Dr. Yue Zhou Profile

Dr. Yue Zhou

Metrology Engineer at GLOBALFOUNDRIES Inc

SPIE Involvement:

Author

Area of Expertise:

wafer geometry , optical profilimetry , scatterometry , semiconductor overlay , diffraction based overlay , patterning development

Publications (8)

Proceedings Article | 26 March 2019 Paper

Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Pedro Herrera, Kun Gao, Chen Dror, Eitan Hajaj, Alon Alexander Volfman, Raviv Yohanan, Vidya Ramanathan, Victoria Naipak, Renan Milo, Tal Yaziv, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Yue Zhou, Abhishek Gottipati

Proceedings Volume 10959, 1095928 (2019) https://doi.org/10.1117/12.2514725

KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry

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Proceedings Article | 26 March 2019 Presentation + Paper

Process drift compensation by tunable wavelength homing in scatterometry-based overlay

Kun Gao, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Abhishek Gottipati

Proceedings Volume 10959, 1095906 (2019) https://doi.org/10.1117/12.2514548

KEYWORDS: Overlay metrology, Scatterometry, Process control

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Proceedings Article | 20 March 2018 Presentation + Paper

Overlay control for 7nm technology node and beyond

Nyan Aung, Woong Jae Chung, Pavan Samudrala, Haiyong Gao, Wenle Gao, Darius Brown, Guanchen He, Bono Park, Michael Hsieh, Xueli Hao, Yen-Jen Chen, Yue Zhou, DeNeil Park, Karsten Gutjahr, Ian Krumanocker, Kevin Jock, Juan Manuel Gomez

Proceedings Volume 10587, 105870A (2018) https://doi.org/10.1117/12.2295828

KEYWORDS: Overlay metrology, Semiconducting wafers, Optical alignment, Reticles, High volume manufacturing, Metrology, HVAC controls, Optimization (mathematics), Scanners, Extreme ultraviolet

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Proceedings Article | 16 March 2018 Paper

Yield impact for wafer shape misregistration-based binning for overlay APC diagnostic enhancement

David Jayez, Kevin Jock, Yue Zhou, Venugopal Govindarajulu, Zhen Zhang, Fatima Anis, Felipe Tijiwa-Birk, Shivam Agarwal

Proceedings Volume 10585, 105851B (2018) https://doi.org/10.1117/12.2302973

KEYWORDS: Semiconducting wafers, Overlay metrology, Lithography, Yield improvement, Scanners, Diagnostics, Process control, Manufacturing, Visualization

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Proceedings Article | 28 March 2017 Paper

Reducing the overlay metrology sensitivity to perturbations of the measurement stack

Yue Zhou, DeNeil Park, Karsten Gutjahr, Abhishek Gottipati, Tam Vuong, Sung Yong Bae, Nicholas Stokes, Aiqin Jiang, Po Ya Hsu, Mark O'Mahony, Andrea Donini, Bart Visser, Chris de Ruiter, Grzegorz Grzela, Hans van der Laan, Martin Jak, Pavel Izikson, Stephen Morgan

Proceedings Volume 10145, 101452G (2017) https://doi.org/10.1117/12.2257913

KEYWORDS: Overlay metrology, Metrology, Scatterometry, Environmental sensing, Image processing, Diffraction gratings, Diffraction, Chemical mechanical planarization, Defense and security, Image analysis

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Proceedings Article | 24 March 2016 Paper

Root cause analysis of overlay metrology excursions with scatterometry overlay technology (SCOL)

Karsten Gutjahr, Dongsuk Park, Yue Zhou, Winston Cho, Ki Cheol Ahn, Patrick Snow, Richard McGowan, Tal Marciano, Vidya Ramanathan, Pedro Herrera, Tal Itzkovich, Janay Camp, Michael Adel

Proceedings Volume 9778, 97781M (2016) https://doi.org/10.1117/12.2219668

KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Diffractive optical elements, Metrology, Photovoltaics, Etching, Detection and tracking algorithms, Signal processing, Optical properties

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Proceedings Article | 15 March 2016 Paper

Patterned wafer geometry (PWG) metrology for improving process-induced overlay and focus problems

Timothy Brunner, Yue Zhou, Cheuk W. Wong, Bradley Morgenfeld, Gerald Leino, Sunit Mahajan

Proceedings Volume 9780, 97800W (2016) https://doi.org/10.1117/12.2218630

KEYWORDS: Semiconducting wafers, Metrology, Lithography, Overlay metrology, Silicon, Error control coding, Distortion, Optical lithography, Process control, Data modeling, Oxides, Silicon films, Thin films

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Proceedings Article | 13 September 2012 Paper

Self calibration for slope-dependent errors in optical profilometry by using the random ball test

Yue Zhou, Young-Sik Ghim, Angela Davies

Proceedings Volume 8493, 84930H (2012) https://doi.org/10.1117/12.928504

KEYWORDS: Calibration, Optical spheres, Confocal microscopy, Spherical lenses, Error analysis, Microscopes, Profilometers, Interferometers, Metrology, Interferometry

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Showing 5 of 8 publications

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