With the continuous shrinking of semiconductor device nodes, the reduction of on-product overlay (OPO) becomes extremely critical for high-yield IC (Integrated Circuit) manufacturing. This requires accurate overlay (OVL) process control which can be better achieved by using an optimized OVL target design and a more advanced metrology platform. The novel rAIM® imaging-based-overlay (IBO) target, which has a grating-over-grating structure with significantly smaller pitch sizes as compared to the standard advanced-imaging-metrology (AIM®) target, can improve OVL measurement accuracy by adopting a more device-compatible design with high Moiré sensitivity. This paper demonstrates the advantages of rAIM targets by comparing and quantifying their performance to standard AIM targets through key parameters including raw OVL, residuals, precision, and total measurement uncertainty (TMU). We also present the performance of rAIM targets on different OVL metrology platforms. We conclude that with an optimized target design and an advanced OVL measurement platform, rAIM targets can be an ideal overlay metrology solution for advanced dynamic random-access memory (DRAM) devices.
The semiconductor industry continually evaluates new materials to improve the process or minimize product variability, which could create measurement challenges for metrology tools in the visible and near-infrared (NIR) spectrum. Opaque materials (i.e., ‘hard masks,’ ‘HM’) are placed in between the resist (i.e., inner layer) and process (i.e., outer layer or underlying layer) in 3D NAND or DRAM processes to control the etch of high aspect-ratio structures to maximize product yield. However, longer wavelengths (e.g., IR WL) may be required to penetrate and properly view the underlying process layer and measure OVL accurately. In this work, longer wavelengths will be evaluated to improve measurement accuracy and keep up with the increasing use of opaque materials, which is expected to increase in future nodes. We will review the benefits of IR WL to OVL measurement accuracy by quantifying the OVL residuals, contrast precision (CP), and total measurement uncertainty (TMU) on multiple DRAM and 3D NAND critical layers.
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