Mr. Yuuki Aritsuka Profile

Yuuki Aritsuka

at Dai Nippon Printing Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 28 June 2005 Paper

Experimental analysis of image placement accuracy of single-membrane masks for LEEPL

Minoru Kitada, Yuuki Aritsuka, Satoshi Yusa, Naoko Kuwahara, Hiroshi Fujita, Tadahiko Takikawa, Hisatake Sano, Morihisa Hoga

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617290

KEYWORDS: Photomasks, Distortion, Charged-particle lithography, Electron beam direct write lithography, Silicon, Image analysis, Lithography, Metrology, Semiconducting wafers, Error analysis

Read Abstract +

Proceedings Article | 20 August 2004 Paper

Development of a LEEPL mask: flatness and IP measurements

Yuuki Aritsuka, Minoru Kitada, Masaru Kurosawa, Tadahiko Takikawa, Hiroshi Fujita, Hisatake Sano, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557777

KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Silicon, Electron beam lithography, Optical testing, Projection lithography, Oxides, Doping, Etching

Read Abstract +

Proceedings Article | 17 December 2003 Paper

200-mm EPL stencil mask fabrication and metrology

Hiroshi Fujita, Tadahiko Takigawa, Mikio Ishikawa, Yu-ki Aritsuka, Satoshi Yusa, Morihisa Hoga, Hisatake Sano

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518034

KEYWORDS: Photomasks, Silicon, Etching, Scanning electron microscopy, Mask making, Optical lithography, Electron beam lithography, Image transmission, Metrology, Projection lithography

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Development of LEEPL 6025 format mask blanks

Yuuki Aritsuka, Yukio Iimura, Morihisa Hoga, Hisatake Sano

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504926

KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Manufacturing, Wafer bonding, Silicon carbide, Silicon, Electron beam lithography, Projection lithography, Ceramics

Read Abstract +

Proceedings Article | 1 August 2002 Paper

Impact of deformation of the edges of two complementary patterns on electron-beam projection lithography mask making

Hisatake Sano, Kenichi Morimoto, Yuuki Aritsuka, Hiroshi Fujita

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476995

KEYWORDS: Critical dimension metrology, Photomasks, Mask making, Projection lithography, Silicon, Data conversion, Electron beams, Electron beam lithography, Control systems, Lithography

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years