Mr. Zhen Cao Profile

Zhen Cao

Doctoral Candidate at Beijing Institute of Technology

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Author

Publications (6)

Proceedings Article | 6 November 2023 Paper

Polarization analysis and experiment research of optical remote sensor

Xiaolin Liu, Yin Huang, Chengguang Cui, Zhen Cao, Xiaohong Zhang, Pengmei Xu

Proceedings Volume 12921, 129215I (2023) https://doi.org/10.1117/12.2692498

KEYWORDS: Polarization, Pupil aberrations, Design and modelling, Matrices, Sensors, Attenuation, Signal attenuation, Ray tracing, Polarized light, Ocean optics

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SPIE Journal Paper | 11 February 2017

Grouping design method of catadioptric projection objective for deep ultraviolet lithography

Zhen Cao, Yanqiu Li, Shanshan Mao

OE, Vol. 56, Issue 02, 025102, (February 2017) https://doi.org/10.1117/12.10.1117/1.OE.56.2.025102

KEYWORDS: Objectives, Deep ultraviolet, Lithography, Combined lens-mirror systems, Mirrors, Lens design, Lithium, Optical engineering, Optical design, Refractor telescopes

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SPIE Journal Paper | 8 July 2015

Design method of off-axis extreme ultraviolet lithographic objective system with a direct tilt process

Yan Liu, Yanqiu Li, Zhen Cao

OE, Vol. 54, Issue 07, 075102, (July 2015) https://doi.org/10.1117/12.10.1117/1.OE.54.7.075102

KEYWORDS: Mirrors, Objectives, Extreme ultraviolet, Lithography, Vignetting, Extreme ultraviolet lithography, Off axis mirrors, Wavefronts, Composites, Bismuth

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SPIE Journal Paper | 9 September 2014 Open Access

Designing projection objectives for 11-nm node of extreme ultraviolet lithography

Zhen Cao, Yanqiu Li, Fei Liu

JM3, Vol. 13, Issue 03, 033014, (September 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.033014

KEYWORDS: Objectives, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Bismuth, Lithium, Ray tracing, Lithography, Semiconducting wafers

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Proceedings Article | 17 April 2014 Paper

Designing extreme-ultraviolet lithographic objective for 11 nm node

Zhen Cao, Yanqiu Li, Fei Liu

Proceedings Volume 9048, 90482F (2014) https://doi.org/10.1117/12.2046218

KEYWORDS: Objectives, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Wavefronts, Photomasks, Ray tracing, Semiconducting wafers, Composites

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SPIE Journal Paper | 16 December 2013 Open Access

Grouping design method with real ray tracing model for extreme ultraviolet lithographic objective

Zhen Cao, Yanqiu Li, Fei Liu

OE, Vol. 52, Issue 12, 125102, (December 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.12.125102

KEYWORDS: Objectives, Mirrors, Extreme ultraviolet, Ray tracing, Lithography, Extreme ultraviolet lithography, Lithium, Aspheric lenses, Paraxial approximations, Reflectivity

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