Mr. Yzzer Roman Profile

Yzzer Roman

at ASML

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 13 June 2022 Presentation

KrF Multi-focal imaging system for advanced and legacy applications

Will Conley, G. Padmabandu, Yzzer Roman, Yingbo Zhao, Toufiq Aman, James Bonafede, Emmanuel Rausa, Rasmus Nielsen, Ijen van Mil, Rongkuo Zhao

Proceedings Volume PC12051, PC120510B (2022) https://doi.org/10.1117/12.2615263

KEYWORDS: Imaging systems, Process control, Photoresist materials, Lithography, 3D image processing, Semiconducting wafers, Scanners, Overlay metrology, Optical lithography, Image processing

Read Abstract +

Proceedings Article | 26 February 2021 Presentation

Full chip computational lithography for KrF multi-focal imaging (MFI) (Conference Presentation)

Will Conley, Vince Vince Plachecki, Stephen Hsu, Michael Crouse, Rongkuo Zhao, John He, Pieter Scheijgrond, Dezheng Sun, Xiaoyang Li, Dongqing Zhang, Ming-Chun Tien, Jun Ye, Rafael Howell, Chen Liu, Xiaolong Zhang, Hai Li, Zuanyi Li, Xiaobo Xie, Jing Su, Yzzer Roman

Proceedings Volume 11613, 116130E (2021) https://doi.org/10.1117/12.2585651

Read Abstract +

Proceedings Article | 21 March 2018 Paper

DUV light source sustainability achievements and next steps

Yzzer Roman, Ted Cacouris, Kumar Raja Guvindan Raju, Dinesh Kanawade, Walt Gillespie, Siqi Luo, Eric Mason, David Manley, Saptaparna Das

Proceedings Volume 10587, 1058716 (2018) https://doi.org/10.1117/12.2299387

KEYWORDS: Light sources, Neon, Deep ultraviolet, Carbon, Metals, Semiconducting wafers, Helium, Semiconductors, Nitrogen

Read Abstract +

Proceedings Article | 20 June 2017 Paper

Advances in DUV light source sustainability

Yzzer Roman, Dinesh Kanawade, Walt Gillespie, Siqi Luo, Mark Thever, Thomas Duffey, Kevin O'Brien, Rahul Ahlawat, Andrei Dorobantu, Eric Gross, Eric Mason

Proceedings Volume 10147, 101471Y (2017) https://doi.org/10.1117/12.2260307

Read Abstract +

Cymer continues to address several areas of sustainability within the semiconductor industry by reducing or eliminating consumption of power and specific types of gas (i.e. neon, helium) required by DUV light sources in order to function. Additionally, Cymer introduced a new recycling technology to reduce the dependence on production of raw gases. In this paper, those initiatives that reduce the operational cost, environmental footprint, and business continuity risk will be discussed.

Cymer has increased the efficiency of its light sources through improvements that have resulted in energy output increase while maintaining the same or requiring less power consumption. For both KrF and ArF systems, there have been component [1], system, and architecture improvements [2] that allowed customers to increase energy efficiency and productivity. An example of module improvements is the latest MO chamber that helped reduce power consumption by ~15%. Future improvements aim to continue reducing the power consumption and cost of operation of the install base and new systems.

The neon supply crisis in 2015 triggered an intensive effort by the lithography light source suppliers to find ways to minimize the use of neon, a main consumable of the light source used in DUV photolithography. Cymer delivered a multi-part support program to reduce natural resource usage, decrease overall cost of operation, and ensure that chipmaker’s business continuity risk is minimized. The methods used to minimize the use of neon for 248 nm and 193 nm photolithography that offered significant relief from supply constraints and reduction of business continuity risk for chipmakers were described in previous work [3]. In this paper, results from the program will be presented.

In addition, techniques to capture the neon effluent and re-purify it within the semiconductor fabs have been pursued. For example, Cymer has developed and validated a neon recycling system for ArF light sources that resides within the chipmaker’s fab. Cymer has partnered with a global gas supplier to develop a system capable of capturing, recycling and delivering <90% of the total neon gas required by multiple ArF light sources through automated operation, including online analysis. In this paper, the neon recycle system performance as demonstrated by a quantitative analysis of facility-supplied gas versus the recycled neon in ArF light source performance will be discussed.

Similarly, DUV light sources have historically used helium as a purge gas in the critical line narrowing module (LNM) to achieve stable wavelength and bandwidth control. Helium has a low coefficient of index of refraction change vs. temperature relative to nitrogen and provides efficient cooling and purging of critical optics in the LNM. Previous work demonstrated how helium consumption can be reduced and still achieve stable performance under all operating conditions [1]. In this paper, results of eliminating the use of helium will be described.

Proceedings Article | 15 March 2016 Paper

Neon reduction program on Cymer ArF light sources

Dinesh Kanawade, Yzzer Roman, Ted Cacouris, Josh Thornes, Kevin O'Brien

Proceedings Volume 9780, 97801H (2016) https://doi.org/10.1117/12.2219942

KEYWORDS: Neon, Light sources, Excimer lasers, Chemical elements, Lithography, Excimers, Deep ultraviolet, Semiconductors, Halogens, Fluorine, Molybdenum

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years