Directed Self-Assembly (DSA) for contact applications

Ming-Hui Weng; Tsung-Han Ko; Chih-Jie Lee; Han-Ping Shen; Chieh-Han Wu; Ken-Hsien Hsieh; Yuan-Chien Huang; Cheng-Han Wu; Chung-Ju Lee; Ching-Yu Chang; Chin-Hsiang Lin

doi:10.1117/12.2303492

13 March 2018 Directed Self-Assembly (DSA) for contact applications

Ming-Hui Weng, Tsung-Han Ko, Chih-Jie Lee, Han-Ping Shen, Chieh-Han Wu, Ken-Hsien Hsieh, Yuan-Chien Huang, Cheng-Han Wu, Chung-Ju Lee, Ching-Yu Chang, Chin-Hsiang Lin

Author Affiliations +

Proceedings Volume 10586, Advances in Patterning Materials and Processes XXXV; 105861D (2018) https://doi.org/10.1117/12.2303492
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Directed self-assembly (DSA) of block copolymers offers opportunities for resolution enhancement of existing patterning by pitch splitting, contact hole (CH) shrinks or, improvement of pattern profile or patterning window.^1-2 By co-optimization of guiding pattern geometry, guiding pattern profile, block copolymer formulation, pattern transfer steps, the after-etch DSA patterns meet target pitch ratio. This DSA assessment shows combination of DSA and single iArF-patterning has potential to meet the specific CD dimension and pitch requirement of a conventional patterns that requires double-patterning.

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Ming-Hui Weng, Tsung-Han Ko, Chih-Jie Lee, Han-Ping Shen, Chieh-Han Wu, Ken-Hsien Hsieh, Yuan-Chien Huang, Cheng-Han Wu, Chung-Ju Lee, Ching-Yu Chang, and Chin-Hsiang Lin "Directed Self-Assembly (DSA) for contact applications", Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 105861D (13 March 2018); https://doi.org/10.1117/12.2303492

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