Interferometric precision measurement of highly reflective thin film using wavelength tuning Fizeau interferometry

Yangjin Kim; Kenichi Hibino; Mamoru Mitsuishi

doi:10.1117/12.2521857

26 April 2019 Interferometric precision measurement of highly reflective thin film using wavelength tuning Fizeau interferometry

Yangjin Kim, Kenichi Hibino, Mamoru Mitsuishi

Author Affiliations +

Proceedings Volume 11032, EUV and X-ray Optics: Synergy between Laboratory and Space VI; 1103213 (2019) https://doi.org/10.1117/12.2521857
Event: SPIE Optics + Optoelectronics, 2019, Prague, Czech Republic

Abstract

Indium tin oxide (ITO) thin films have been widely used in displays such as liquid crystal displays and touch panels because of their favorable electrical conductivity and optical transparency. The surface shape and thickness of ITO thin films must be precisely measured to improve their reliability and performance. Conventional measurement techniques take single point measurements and require expensive systems. In this paper, we measure the surface shape of an ITO thin film on top of a transparent plate using wavelength-tuning Fizeau interferometry. The surface shape was determined by compensating for the phase error introduced by optical interference from the thin film, which was calculated using the phase and amplitude distributions measured by wavelength-tuning. The proposed measurement method achieved noncontact, large-aperture, and precise measurements of transparent thin films. The surface shape of the sample was experimentally measured to an accuracy of 40 nm, mainly limited by the accuracy of the reference surface of 30 nm.

Citation Download Citation

Yangjin Kim, Kenichi Hibino, and Mamoru Mitsuishi "Interferometric precision measurement of highly reflective thin film using wavelength tuning Fizeau interferometry", Proc. SPIE 11032, EUV and X-ray Optics: Synergy between Laboratory and Space VI, 1103213 (26 April 2019); https://doi.org/10.1117/12.2521857

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