Presentation
5 March 2021 Recent progress and future trends in MOCVD growth technology for light emitting diodes
Michael Heuken, Adam Boyd, Assadullah Alam, Hassan Larhrib, Arthur Beckers
Author Affiliations +
Abstract
To enable LED technology we developed the MOCVD technology for III-As/P/N based structures in reactors ranging from small scale to large production scale Planetary Reactors. The closed coupled showerhead reactor series (CCS reactor) and the Planetary Reactor® developed in parallel and both gave production proven results. The focus of epitaxy production technology developments has been put on improved process control, productivity enhancements, in-situ metrology for smart system control and predictive maintenance. A comprehensive summary and recent progress will be reported here. The application of the underlying physical, technical and chemical fundamentals explain the engineering concept.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael Heuken, Adam Boyd, Assadullah Alam, Hassan Larhrib, and Arthur Beckers "Recent progress and future trends in MOCVD growth technology for light emitting diodes", Proc. SPIE 11706, Light-Emitting Devices, Materials, and Applications XXV, 117060Z (5 March 2021); https://doi.org/10.1117/12.2575628
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KEYWORDS
Light emitting diodes

Metalorganic chemical vapor deposition

Control systems

Semiconducting wafers

Epitaxy

Interfaces

Light sources and illumination

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