Ion beam milling of thin films for optical fabrication

Charles M. Egert

doi:10.1117/12.167954

1 February 1994 Ion beam milling of thin films for optical fabrication

Charles M. Egert

Proceedings Volume 1994, Advanced Optical Manufacturing and Testing IV; (1994) https://doi.org/10.1117/12.167954
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

The work reported here examines the roughness evolution of several thin films including gold, copper, aluminum and silicon; all applied to fused silica substrates. The films were deposited by an ion beam sputtering process and ranged in thickness from a few hundred nanometers to several micrometers. Roughness evolution during ion milling was evaluated by exposing the thin films to an argon ion beam and measuring roughness at regular intervals until the thin film was completely removed. These results suggest that roughness evolution depends on initial film roughness as well as depth of material removed.

Citation Download Citation

Charles M. Egert "Ion beam milling of thin films for optical fabrication", Proc. SPIE 1994, Advanced Optical Manufacturing and Testing IV, (1 February 1994); https://doi.org/10.1117/12.167954

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