Electron-Beam Directly Written Micro Gratings For Integrated Optical Circuits

H. Nishihara; Y. Handa; T. Suhara,; J. Kovama

doi:10.1117/12.959199

25 February 1981 Electron-Beam Directly Written Micro Gratings For Integrated Optical Circuits

H. Nishihara, Y. Handa, T. Suhara,, J. Kovama

Proceedings Volume 0239, Guided Wave Optical and Surface Acoustic Wave Devices: Systems and Applications; (1981) https://doi.org/10.1117/12.959199
Event: 24th Annual Technical Symposium, 1980, San Diego, United States

Abstract

The principles and techniques of writing various types of micro gratings directly on chalcogenide (As2S3) film waveguides using the electron beam are reviewed. A computer-controlled apparatus has been developed so that we can fabricate any gratings of uniform/ chirped periods with slant lines which have the area of the order of 1 mm2, the diffraction efficiency of nearly 100 %, and the minimum grating period of 0.2 µm. Combination of those micro gratings results in integrated grating circuits (IGC). An IGC for guided-beam multiple division has been successfully fabricated.

Citation Download Citation

H. Nishihara, Y. Handa, T. Suhara,, and J. Kovama "Electron-Beam Directly Written Micro Gratings For Integrated Optical Circuits", Proc. SPIE 0239, Guided Wave Optical and Surface Acoustic Wave Devices: Systems and Applications, (25 February 1981); https://doi.org/10.1117/12.959199

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