Development of plasma-enhanced CVD for multilayer mirror coatings

Carl B. Freidhoff; Harry Buhay; William D. Partlow; Donald L. Decker; Karl A. Klemm

doi:10.1117/12.213717

14 July 1995 Development of plasma-enhanced CVD for multilayer mirror coatings (Abstract Only)

Carl B. Freidhoff, Harry Buhay, William D. Partlow, Donald L. Decker, Karl A. Klemm

Proceedings Volume 2428, Laser-Induced Damage in Optical Materials: 1994; (1995) https://doi.org/10.1117/12.213717
Event: Laser-Induced Damage in Optical Materials: 1994, 1994, Boulder, CO, United States

Abstract

PECVD is an attractive technique for depositing coatings of refractory optical materials because of the ability to control composition (to assure low absorption), the low substrate temperature required, and the high deposition rate attainable. Deposition processes have been established that achieve thin films with low absorption, low scatter, good thickness uniformity, and environmental durability. Multilayer dielectric- enhanced IR reflectance mirrors using a variety of silicon-based refractory materials have been fabricated and evaluated. Results of optical and physical characterizations and environmental testing will be presented.

Citation Download Citation

Carl B. Freidhoff, Harry Buhay, William D. Partlow, Donald L. Decker, and Karl A. Klemm "Development of plasma-enhanced CVD for multilayer mirror coatings (Abstract Only)", Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); https://doi.org/10.1117/12.213717

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