193-nm imaging using a small-field high-resolution imaging resist exposure tool

Nadeem Hasan Rizvi; Malcolm C. Gower; Dominic Ashworth; Neil Sykes; Phil T. Rumsby; Bruce W. Smith; Francis N. Goodall; Ronald Albert Lawes

doi:10.1117/12.240981

7 June 1996 193-nm imaging using a small-field high-resolution imaging resist exposure tool

Nadeem Hasan Rizvi, Malcolm C. Gower, Dominic Ashworth, Neil Sykes, Phil T. Rumsby, Bruce W. Smith, Francis N. Goodall, Ronald Albert Lawes

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Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240981
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

A 193nm excimer laser microstepper has been developed for deep UV photolithography research at this wavelength. The system incorporates a x10, 0.5NA, 4mm field diameter, high-resolution imaging lens of either all-refractive or catadioptric design. An all-fused silica refractive lens has been used in the results reported here to carry out exposures in polymethylmethacrylate and polyvinylphenol photoresists. Well-resolved images of 0.2micrometers dense lines and spaces and 0.35micrometers diameter contact holes have been produced in PMMA and polyvinylphenol resists.

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Nadeem Hasan Rizvi, Malcolm C. Gower, Dominic Ashworth, Neil Sykes, Phil T. Rumsby, Bruce W. Smith, Francis N. Goodall, and Ronald Albert Lawes "193-nm imaging using a small-field high-resolution imaging resist exposure tool", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240981

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