Real-time stage position measurement with nanometer-scale accuracy

Philip D. Henshaw; Donald P. DeGloria; Sandra A. Kelly; Robert F. Dillon

doi:10.1117/12.276047

7 July 1997 Real-time stage position measurement with nanometer-scale accuracy

Philip D. Henshaw, Donald P. DeGloria, Sandra A. Kelly, Robert F. Dillon

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276047
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Air turbulence affects the performance of the Helium-Neon interferometer used to control the wafer stage of stepper or step-and-scan lithography systems. In this paper, we describe characterization and reduction of the major error sources in an Air Turbulence Compensated Interferometer designed to address this problem.

Citation Download Citation

Philip D. Henshaw, Donald P. DeGloria, Sandra A. Kelly, and Robert F. Dillon "Real-time stage position measurement with nanometer-scale accuracy", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276047

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