Properties of films deposited by different discharges in Sb(C2H5)3 vapor

Nikolay Glazirin; Konstantin P. Gritsenko

doi:10.1117/12.360115

7 September 1999 Properties of films deposited by different discharges in Sb(C₂H₅)₃ vapor

Nikolay Glazirin, Konstantin P. Gritsenko

Proceedings Volume 3738, Advances in Optical Interference Coatings; (1999) https://doi.org/10.1117/12.360115
Event: Optical Systems Design and Production, 1999, Berlin, Germany

Abstract

Thin metal-filled polymer films produced by low temperature plasma are used as resistors, protective coatings, catalyzers. Among the others they are used for optical recording media. The possibility to use MOC PECVD for optical recording media production using the Te-based precursors was shown. Sb-based metal-polymer films also attract attention before because Sb is less toxic and more stable, than Te. In this work authors used plasma polymerization with simultaneous Sb evaporation forma boat. In the researches known before the precursor dissociation during PECVD is carried out mainly by low frequency, radio frequency and microwave discharges. Each of these discharges have peculiarities which result on film properties. But all these discharges effect on both dissociation and polymerization processes, which leads to difficulties to obtain films with predetermined properties. It was known before, that the pulsed discharge use for polymerization of organic monomers allows to rule of the ratio between dissociation and polymerization processes, what effects strongly films properties.

Citation Download Citation

Nikolay Glazirin and Konstantin P. Gritsenko "Properties of films deposited by different discharges in Sb(C₂H₅)₃ vapor", Proc. SPIE 3738, Advances in Optical Interference Coatings, (7 September 1999); https://doi.org/10.1117/12.360115

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