Electron beam mastering process realizing over 100-GB/layer capacity disc

Minoru Takeda; Motohiro Furuki; Masanobu Yamamoto; Masataka Shinoda; Kimihiro Saito; Yuichi Aki; Hiroshi Kawase; Mitsuru Koizumi; Toshiaki Miyokawa; Masao Mutou

doi:10.1117/12.533039

16 September 2003 Electron beam mastering process realizing over 100-GB/layer capacity disc

Minoru Takeda, Motohiro Furuki, Masanobu Yamamoto, Masataka Shinoda, Kimihiro Saito, Yuichi Aki, Hiroshi Kawase, Mitsuru Koizumi, Toshiaki Miyokawa, Masao Mutou

Author Affiliations +

Proceedings Volume 5069, Optical Data Storage 2003; (2003) https://doi.org/10.1117/12.533039
Event: Optical Data Storage 2003, 2003, Vancouver, Canada

Abstract

We have demonstrated the capability of 100GB density recording by the electron beam mastering and readout by a near-field optical pick-up with an effective NA of 2.05 and a blue LD of 405 nm wavelength. The Si disc of 100GB density was fabricated by the optimized Si etching process condition to form suitable pit pattern shape for the near-field readout.

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Minoru Takeda, Motohiro Furuki, Masanobu Yamamoto, Masataka Shinoda, Kimihiro Saito, Yuichi Aki, Hiroshi Kawase, Mitsuru Koizumi, Toshiaki Miyokawa, and Masao Mutou "Electron beam mastering process realizing over 100-GB/layer capacity disc", Proc. SPIE 5069, Optical Data Storage 2003, (16 September 2003); https://doi.org/10.1117/12.533039

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