Reticle surface contaminants and their relationship to subpellicle particle formation

Brian J. Grenon; Kaustuve Bhattacharyya; William Waters Volk; Andre Poock

doi:10.1117/12.518105

17 December 2003 Reticle surface contaminants and their relationship to subpellicle particle formation

Brian J. Grenon, Kaustuve Bhattacharyya, William Waters Volk, Andre Poock

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.518105
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

Sub-pellicle particle formation continues to be a significant problem in semiconductor fabs. We have previously reported on the identification of various defects detected on reticles after extended use. This paper provides a comprehensive evaluation of various molecular contaminants found on the backside surface of a reticle used in high-volume production. Previously all or most of the photo-induced contaminants were detected under the pellicle. This particular contamination is a white "haze" detected by pre-exposure inspection using KLA-Tencor TeraStar STARlight with Un-patterned Reticle Surface Analysis, (URSA). Chemical analysis was done using Time-of-Flight Secondary Ion Mass Spectroscopy (ToF-SIMS) and Raman spectroscopy.

Citation Download Citation

Brian J. Grenon, Kaustuve Bhattacharyya, William Waters Volk, and Andre Poock "Reticle surface contaminants and their relationship to subpellicle particle formation", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.518105

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