Study of segmented overlay mark fidelity based on electrical property of device

Akiyuki Minami; Sachiko Yabe; Takashi Nasuno; Yoshihisa Matsubara; Koichiro Tsujita

doi:10.1117/12.598654

10 May 2005 Study of segmented overlay mark fidelity based on electrical property of device

Akiyuki Minami, Sachiko Yabe, Takashi Nasuno, Yoshihisa Matsubara, Koichiro Tsujita

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.598654
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Pattern placement error (PPE) of device pattern and overlay mark does not necessarily coincide. So it is important to measure PPE of device pattern accurately for optimizing overlay mark design. But it has been hard. To resolve this problem a new method has been developed. As a device pattern via chain pattern is used that consists of 1st metal, via, and 2nd metal layers. The electrical resistance is almost determined by the contact area of metal and via which depend on their mutual overlay. Since the resistance is inversely proportional to the contact area, the resistance changes sharply as the overlay error becomes large. With the characteristic the fine measurement accuracy of about 1nm has been gotten. We evaluate the relation of PPE between the device pattern and various types of overlay marks such as box in box mark and device size-segmented mark on 65nm node Cu interconnect. As a result, it has been confirmed that the device size-segmented mark most represents the PPE of device pattern at various aberrations.

Citation Download Citation

Akiyuki Minami, Sachiko Yabe, Takashi Nasuno, Yoshihisa Matsubara, and Koichiro Tsujita "Study of segmented overlay mark fidelity based on electrical property of device", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.598654

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KEYWORDS

Metals

Overlay metrology

Resistance

Personal protective equipment

Optical proximity correction

Copper

Neodymium

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