Temperature Uniformity Measurement Techniques For Rapid Thermal Processing

Carl Russo

doi:10.1117/12.961202

26 June 1986 Temperature Uniformity Measurement Techniques For Rapid Thermal Processing

Carl Russo

Proceedings Volume 0623, Advanced Processing and Characterization of Semiconductors III; (1986) https://doi.org/10.1117/12.961202
Event: O-E/LASE'86 Symposium, 1986, Los Angeles, CA, United States

Abstract

Temperature and temperature uniformity measurements in rapid thermal processing (RTP) require accurate, non-contact methods which operate over the temperature range of approximately 300-1400°C with accuracies and reproducibilities of better than 5°C. Non-contact methods for temperature measurements include [optical and infrared pyrometry] comparison measurements made by thermocouples inserted into dummy samples, and methods for temperature uniformity measurement include multiple sensor measurements over the wafer and a variety of process tests which include oxide growth, silicide sintering, polysilicon annealing, partial activation recrystallization and localized melting. Once the temperature measurement has been successfully completed, the results can be used for temperature control. Temperature control techniques include a mixture of optimal nonlinear, PID, and computer control.

Citation Download Citation

Carl Russo "Temperature Uniformity Measurement Techniques For Rapid Thermal Processing", Proc. SPIE 0623, Advanced Processing and Characterization of Semiconductors III, (26 June 1986); https://doi.org/10.1117/12.961202

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