Reflective optics for sub-10nm hard x-ray focusing

H. Mimura; S. Matsuyama; H. Yumoto; S. Handa; T. Kimura; Y. Sano; K. Tamasaku; Y. Nishino; M. Yabashi; T. Ishikawa; K. Yamauchi

doi:10.1117/12.734752

20 September 2007 Reflective optics for sub-10nm hard x-ray focusing

H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, T. Kimura, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi

Author Affiliations +

Proceedings Volume 6705, Advances in X-Ray/EUV Optics and Components II; 67050L (2007) https://doi.org/10.1117/12.734752
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

Nanofocused X-rays are indispensable because they can provide high spatial resolution and high sensitivity for X-ray nanoscopy/spectroscopy. A focusing system with reflective optics is one of the most promising methods for producing nanofocused X-rays due to its high efficiency and beams size. So, far we realize efficient hard X-ray focusing with a beam size of 25nm. Our next project is realization of sub-10nm hard X-ray focusing. Here, we describe the design of the graded multilayer mirror and evaluation method for hard X-ray focused beam.

Citation Download Citation

H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, T. Kimura, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, and K. Yamauchi "Reflective optics for sub-10nm hard x-ray focusing", Proc. SPIE 6705, Advances in X-Ray/EUV Optics and Components II, 67050L (20 September 2007); https://doi.org/10.1117/12.734752

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