Estimation of cost comparison of lithography technologies at the 22-nm half-pitch node

Andrea Wüest; Andrew J. Hazelton; Greg Hughes

doi:10.1117/12.814255

17 March 2009 Estimation of cost comparison of lithography technologies at the 22-nm half-pitch node

Andrea Wüest, Andrew J. Hazelton, Greg Hughes

Proceedings Volume 7271, Alternative Lithographic Technologies; 72710Y (2009) https://doi.org/10.1117/12.814255
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

The cost of ownership (CoO) of candidate technologies for 22 nm half-pitch lithography is calculated. To more accurately compare technologies with different numbers of process steps, a model that includes deposition, etching, metrology, and other costs is created. For 22 nm half-pitch nodes, extreme ultraviolet lithography (EUVL) has a significant cost advantage over other technologies under certain mask cost assumptions. Double patterning, however, may be competitive under worst-case EUVL mask cost assumptions. Sensitivity studies of EUVL CoO to throughput and uptime show EUVL may be cost-competitive at lower uptime and throughput conditions. Finally, calculation of the CoO of 450 mm lithography shows that the expected cost reduction is between 0% and 15%.

Citation Download Citation

Andrea Wüest, Andrew J. Hazelton, and Greg Hughes "Estimation of cost comparison of lithography technologies at the 22-nm half-pitch node", Proc. SPIE 7271, Alternative Lithographic Technologies, 72710Y (17 March 2009); https://doi.org/10.1117/12.814255

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