Innovative processes investigation for photomask pod conditioning and drying

J. M. Foray; C. Rude; J. Palisson; M. Davenet; A. Favre; D. Cheung; F. Dufaye; S. Gough; P. Richteiger; V. Baudiquez; E. Foca; P. Nesladek; S. Gopalakrishnan; K. Avary; I. Höllein

doi:10.1117/12.835198

27 May 2009 Innovative processes investigation for photomask pod conditioning and drying

J. M. Foray, C. Rude, J. Palisson, M. Davenet, A. Favre, D. Cheung, F. Dufaye, S. Gough, P. Richteiger, V. Baudiquez, E. Foca, P. Nesladek, S. Gopalakrishnan, K. Avary, I. Höllein

Author Affiliations +

Proceedings Volume 7470, 25th European Mask and Lithography Conference; 747010 (2009) https://doi.org/10.1117/12.835198
Event: 25th European Mask and Lithography Conference, 2009, Dresden, Germany

Abstract

Contamination and especially Airbone Molecular Contamination (AMC) is a critical issue for mask material flow with a severe and fairly unpredictable risk of induced contamination and damages especially for 193 nm lithography. It is therefore essential to measure, to understand and then try to reduce AMC in mask environment. Results and assessment of mask pod environment in term of molecular contamination was presented in a first step (1¹). Then in second step further studies was carried out within European CRYSTAL project in order to reduce mask pod influence and contamination due to material out gassing. Results are shown here. These studies were carried out in the frame of the European R&D project, the so called "CRYSTAL" project, focusing on photomask defect reduction.

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J. M. Foray, C. Rude, J. Palisson, M. Davenet, A. Favre, D. Cheung, F. Dufaye, S. Gough, P. Richteiger, V. Baudiquez, E. Foca, P. Nesladek, S. Gopalakrishnan, K. Avary, and I. Höllein "Innovative processes investigation for photomask pod conditioning and drying", Proc. SPIE 7470, 25th European Mask and Lithography Conference, 747010 (27 May 2009); https://doi.org/10.1117/12.835198

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