Optimum sensor placement in microchannel reactors: design tool applications

Mehmet Sen; Jason Fiering; Gregory J. Kowalski; Dale Larson

doi:10.1117/12.876463

14 February 2011 Optimum sensor placement in microchannel reactors: design tool applications

Mehmet Sen, Jason Fiering, Gregory J. Kowalski, Dale Larson

Proceedings Volume 7929, Microfluidics, BioMEMS, and Medical Microsystems IX; 79290K (2011) https://doi.org/10.1117/12.876463
Event: SPIE MOEMS-MEMS, 2011, San Francisco, California, United States

Abstract

A computational analysis of a microchannel reacting flow that includes diffusion and heat transfer processes to determine design rules for sensor placement is described. The objective is to optimize the positioning of nanohole array sensors which measure concentration and temperature and to analyze the characteristics of the local quantities sensed by nanohole arrays. Because the position and minimum spacing of the sensors are limited by material and fabrication constraints, the computational analysis is used to verify the effectiveness and limitations of this approach. Thermal boundary analysis is performed to analyze the relation between the sensed layer (micro-sensing region) over the nanohole array sensors and the boundary layer development. The relationship between the sensor position and the nodes of the numerical solution that limit this design process are discussed.

Citation Download Citation

Mehmet Sen, Jason Fiering, Gregory J. Kowalski, and Dale Larson "Optimum sensor placement in microchannel reactors: design tool applications", Proc. SPIE 7929, Microfluidics, BioMEMS, and Medical Microsystems IX, 79290K (14 February 2011); https://doi.org/10.1117/12.876463

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