Magnetron Sputtering High Tc Films From Metal Alloy Targets

Michael Scheuermann; Cheng-Chung Chi; Chang C. Tsuei; Jochen D. Mannhart

doi:10.1117/12.947475

23 August 1988 Magnetron Sputtering High Tc Films From Metal Alloy Targets

Michael Scheuermann, Cheng-Chung Chi, Chang C. Tsuei, Jochen D. Mannhart

Proceedings Volume 0948, High-Tc Superconductivity: Thin Films and Devices; (1988) https://doi.org/10.1117/12.947475
Event: Advances in Semiconductors and Superconductors: Physics and Device Applications, 1988, Newport Beach, CA, United States

Abstract

High Tc YBaCuO thin films have been deposited by dc magnetron sputtering from two metal alloy targets. Oxygen was sprayed directly onto the film to be chemically incorporated into the film. Since most of the oxygen was absorbed by the film directly, low oxygen partial pressure was achieved to avoid target oxidation. Epitaxial and polycrystalline films with onsets at 92 K having 1 K transition widths have been produced. Films have been deposited on a variety of substrates including LiNbO₃ and LiTa0₃. For potential application in electronic devices and for many electrical measurements, it is important to pattern the films. Laser patterning has been demonstrated successfully with no degradation of the film properties. The advantages of laser processing are short turn around time and no wet processing associated with conventional lithography. Using this technique, lines as narrow as 1 micron have been fabricated.

Citation Download Citation

Michael Scheuermann, Cheng-Chung Chi, Chang C. Tsuei, and Jochen D. Mannhart "Magnetron Sputtering High Tc Films From Metal Alloy Targets", Proc. SPIE 0948, High-Tc Superconductivity: Thin Films and Devices, (23 August 1988); https://doi.org/10.1117/12.947475

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