Replication and subdivision of chromium nano-grating in atom lithography

Xiao Deng; Jie Chen; Jie Liu; Yan Ma; Xinbin Cheng; Tongbao Li

doi:10.1117/12.2191128

24 September 2015 Replication and subdivision of chromium nano-grating in atom lithography

Xiao Deng, Jie Chen, Jie Liu, Yan Ma, Xinbin Cheng, Tongbao Li

Proceedings Volume 9628, Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V; 96281O (2015) https://doi.org/10.1117/12.2191128
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

Atom lithography is a novel technique for nanofabrication which can be used to grow periodic arrays of highly uniform nanometer-scale structures. The pitch standard of Cr nano-grating is 212.8±0.1 nm, which coincides with λ/2 of the standing wave, in correspondence with the ⁵²Cr atomic resonance transition: ⁷S₃ → ⁷P₄⁰, λ= 425.55 nm. With the utilization of the material removal ability by AFM scratching, the Cr nanostructures have been transferred to an InP substrate for replication and subdivision. The uncertainty analysed based on gravity centre (GC) method is better than 0.5% for both replicated and subdivided nano-gratings. AFM lithography method expands the application of atom lithography in metrology to a smaller scale with high precision.

Citation Download Citation

Xiao Deng, Jie Chen, Jie Liu, Yan Ma, Xinbin Cheng, and Tongbao Li "Replication and subdivision of chromium nano-grating in atom lithography", Proc. SPIE 9628, Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, 96281O (24 September 2015); https://doi.org/10.1117/12.2191128

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