We present novel fabrication methods for complex microoptics. Gray scale lithography enables the writing of complex microoptical doublet structures with unprecedented surface smoothness and without slicing steps. We demonstrate diffraction limited imaging performance. Interferometric wavefront measurement confirm wavefront aberrations below lambda/10. Furthermore, we present new applications using black photoresists for direct printing of hulls and aperture stops.These techniques enable printing of high-NA achromatic optical trapping objectives directly on fibers, forward and side-looking OCT objectives, highly efficient couplers from quantum dots into fibers, couplers for single photon quantum detectors, and high-NA miniature fiber endoscopes with unprecedented image quality.
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