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Proceedings Article

Grooved infrared polarizers with a reduced reflectance

[+] Author Affiliations
Itsunari Yamada, Mitsunori Saito

Ryukoku Univ. (Japan)

Junji Nishii

National Institute of Advanced Industrial Science and Technology (Japan)

Proc. SPIE 6414, Smart Structures, Devices, and Systems III, 64141V (January 08, 2007); doi:10.1117/12.695729
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From Conference Volume 6414

  • Smart Structures, Devices, and Systems III
  • Said F. Al-Sarawi
  • Adelaide, Australia | December 10, 2006

abstract

We fabricated an infrared wire-grid polarizer that was made of a tungsten silicide (WSi) grating on a Si substrate. The photolithography by the use of the two-beam interference was conducted for generating the short-period grating structure. This photoresist pattern was used as a mask for the reactive ion etching of the WSi coating and the Si substrate. Consequently, we could fabricate the WSi/Si grating with 400-nm period and 550-nm depth that acted as a wire-grid polarizer. The transmittance of TM polarization was 58% at 4-μm wavelength, which exceeded the theoretical transmittance of Si (54%). This enhancement of the transmittance was caused by the reduction in the reflectance due to the subwavelength-grating structure. The extinction ratio at 2.7-μm wavelength was 20 dB. We also measured the extinction coefficient κ of WSi, and verified that WSi was a suitable polarizing material in the mid-infrared range.

© (2006) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Itsunari Yamada ; Junji Nishii and Mitsunori Saito
"Grooved infrared polarizers with a reduced reflectance", Proc. SPIE 6414, Smart Structures, Devices, and Systems III, 64141V (January 08, 2007); doi:10.1117/12.695729; http://dx.doi.org/10.1117/12.695729


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