Paper
18 February 2011 Design of the chirped multilayer mirrors in extreme ultraviolet region for ultrafast applications
Fengli Wang, Lei Liu, Jingtao Zhu, Zhong Zhang, Lingyan Chen
Author Affiliations +
Proceedings Volume 7995, Seventh International Conference on Thin Film Physics and Applications; 799509 (2011) https://doi.org/10.1117/12.888421
Event: Seventh International Conference on Thin Film Physics and Applications, 2010, Shanghai, China
Abstract
Chirped Mo/Si multilayer mirrors used in 13-17nm region have been designed using analytical approach based on the combination of genetic algorithm and simplex algorithm. The Cauchy equation and the polynomial expression were used to fit the real part and the imaginary part of the optical constants of Mo and Si in the wavelength region of 12.8-17.2nm, respectively. The reflectivity, reflective phase, group delay and group delay dispersion of the multilayer were calculated based on the Fresnel iterative equations. The initial structure of the multilayer was obtained by using the genetic algorithm, and the final structure of the mirror was optimized by using the simplex algorithm. We got the different multilayer mirrors for the target GDD of -2800 as2, -3600 as2, and -6500 as2. For these three multilayer mirrors, the average reflectivities in the wavelength range of 13-17 nm are 7.00± 0.08 %, 5.99 ±0.05 %, and 6.00±0.05 %, respectively. And the average GDD in the same wavelength range are -2793.22±104.00 as2,-3597.44±79.06 as2, and - 6498.13±59.96 as2. In addition, the effects of the interface roughness on the reflectivity and the phase were discussed. It is found that the reflectivity is sensitive to the interface roughness, but the phase is insensitive.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fengli Wang, Lei Liu, Jingtao Zhu, Zhong Zhang, and Lingyan Chen "Design of the chirped multilayer mirrors in extreme ultraviolet region for ultrafast applications", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 799509 (18 February 2011); https://doi.org/10.1117/12.888421
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Mirrors

Reflectivity

Multilayers

Interfaces

Genetic algorithms

Extreme ultraviolet

Silicon

Back to Top