Evolving optical lithography without EUV

Donis G. Flagello; Stephen P. Renwick

doi:10.1117/12.2086357

26 March 2015 Evolving optical lithography without EUV

Proceedings Volume 9426, Optical Microlithography XXVIII; 942604 (2015) https://doi.org/10.1117/12.2086357
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

This talk will examine the evolutionary path of optical lithography without EUV. We explore the previous history to understand the various solutions that have emerged. This will give insight into future possibilities. We will examine the possible limits and fundamental problems moving into the sub-10nm node regime. Finally, the cost implications and future technologies are explored.

Citation Download Citation

Donis G. Flagello and Stephen P. Renwick "Evolving optical lithography without EUV", Proc. SPIE 9426, Optical Microlithography XXVIII, 942604 (26 March 2015); https://doi.org/10.1117/12.2086357

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