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Proceedings Article

Development of the reliable 20 kW class pulsed carbon dioxide laser system for LPP EUV light source

[+] Author Affiliations
Junichi Fujimoto, Hakaru Mizoguchi

Gigaphoton Inc. (Japan)

Takeshi Ohta, Krzysztof M. Nowak, Takashi Suganuma, Hidenobu Kameda, Masato Moriya, Toshio Yokoduka, Koji Fujitaka

Komatsu Ltd. (Japan)

Akira Sumitani

EUVA/Komatsu Ltd. (Japan)

Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692S (April 07, 2011); doi:10.1117/12.879181
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From Conference Volume 7969

  • Extreme Ultraviolet (EUV) Lithography II
  • Bruno M. La Fontaine; Patrick P. Naulleau
  • San Jose, California | February 27, 2011

abstract

Laser Produced Plasma (LPP) Extreme Ultra Violet (EUV) light source is expected to be used for next generation lithography. To realize such performance for industrial use, the main driver laser is one of the key components. Our source uses a high power pulsed carbon dioxide (CO2) laser as a plasma driver. A master oscillator and a power amplifier (MOPA) system based on a new configuration of an RF-excited CO2 laser is the key to high efficiency. This pulsed CO2 laser system has started to operate. This report shows its initial performance. Also for a reliable industrial system, the optical instability caused by vibration and thermal distortion of optics should be suppressed at 20 kW output level. The primary design of key modules, such as mirrors, for the CO2 laser, and dynamic design concepts are shown in this report. We have achieved 7.6 kW, 14 nsec, 100 kHz pulsed output in this configuration.

© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Junichi Fujimoto ; Takeshi Ohta ; Krzysztof M. Nowak ; Takashi Suganuma ; Hidenobu Kameda, et al.
"Development of the reliable 20 kW class pulsed carbon dioxide laser system for LPP EUV light source", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692S (April 07, 2011); doi:10.1117/12.879181; http://dx.doi.org/10.1117/12.879181


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