Fabrication of a new BEAMETR chip for automatic electron beam size measurement

S. Babin; K. Bay; S. Cabrini; S. Dhuey; B. Harteneck; M. Machin; C. Peroz

doi:10.1117/12.850967

1 April 2010 Fabrication of a new BEAMETR chip for automatic electron beam size measurement

S. Babin, K. Bay, S. Cabrini, S. Dhuey, B. Harteneck, M. Machin, C. Peroz

Proceedings Volume 7638, Metrology, Inspection, and Process Control for Microlithography XXIV; 76383N (2010) https://doi.org/10.1117/12.850967
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

BEAMETR (BEAm METRology) technique is demonstrated as an attractive solution for automatic measurement of electron beam sizes in two coordinates. The method associates one software and one specially designed pattern chip. The fabrication of new BEAMETR design is performed by electron beam lithography and metal lift-off. A specific bi-layer resist system and proximity correction is used for achieving the requirements for the "pound-key" shape of BEAMETR pattern. Beam sizes in two coordinates (x,y) of Scanning Electron Microscope are measured for various operating conditions. This method allows measuring electron beam sizes down to 2 nanometers.

Citation Download Citation

S. Babin, K. Bay, S. Cabrini, S. Dhuey, B. Harteneck, M. Machin, and C. Peroz "Fabrication of a new BEAMETR chip for automatic electron beam size measurement", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76383N (1 April 2010); https://doi.org/10.1117/12.850967

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