Paper
16 February 2009 Fabrication technique for moth-eye structure using low-energy electron-beam projection lithography for high-performance blue-light-emitting diode on SiC substrate
T. Seko, S. Mabuchi, F. Teramae, A. Suzuki, Y. Kaneko, R. Kawai, S. Kamiyama, M. Iwaya, H. Amano, I. Akasaki
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Abstract
To realize high-efficiency light-emitting diodes (LEDs), it is indispensable to increase light extraction efficiency. We propose the moth-eye structure on the surface of an LED chip, which consists of periodic cones with a pitch of optical wavelength scale, and enables the significantly enhancement of light extraction efficiency. We have developed a new technique for moth-eye structure fabrication, on the basis of low-energy electron-beam projection lithography (LEEPL), which can be applied to the mass production of LEDs. The moth-eye structure formed at the bottom of a SiC wafer has periodically arranged cones with a 300 nm pitch and a 750 nm height. We also present blue LEDs fabricated on SiC substrates with and without the moth-eye structure, and discuss the effect of the moth-eye structure on the performance of LEDs.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
T. Seko, S. Mabuchi, F. Teramae, A. Suzuki, Y. Kaneko, R. Kawai, S. Kamiyama, M. Iwaya, H. Amano, and I. Akasaki "Fabrication technique for moth-eye structure using low-energy electron-beam projection lithography for high-performance blue-light-emitting diode on SiC substrate", Proc. SPIE 7216, Gallium Nitride Materials and Devices IV, 721628 (16 February 2009); https://doi.org/10.1117/12.811348
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Cited by 6 scholarly publications.
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KEYWORDS
Antireflective coatings

Light emitting diodes

Silicon carbide

Fabrication

Projection lithography

Blue light emitting diodes

Electron beam lithography

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