Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Interference patterning of gratings with a period of 150 nm at a wavelength of 157 nm

[+] Author Affiliations
Gerald Fuetterer, Johannes Schwider

Friedrich-Alexander Univ. Erlangen-Nuernberg (Germany)

Waltraud Herbst, Joerg Rottstegge, Michael Sebald

Infineon Technologies AG (Germany)

Margit Ferstl

Heinrich-Hertz-Institut fuer Nachrichtentechnik Berlin GmbH (Germany)

Proc. SPIE 4691, Optical Microlithography XV, 1703 (July 15, 2002); doi:10.1117/12.474559
Text Size: A A A
From Conference Volume 4691

  • Optical Microlithography XV
  • Anthony Yen
  • Santa Clara, CA | March 03, 2002

abstract

A system producing an optical pattern with a high spatial frequency at (lambda) equals 157 nm has been built to be used as a photoresist tool for the 157 nm lithography. In order to generate a test pattern with a high spatial frequency, two-beam interference was used to overcome the limits of existing mask-projection systems using numerical apertures up to 0.65. In order to work without phase lock techniques a e-beam phase grating was used for providing the two interfering wave fronts for the generation of 150 nm-structures. The phase grating is illuminated under the Bragg-angle. Only two diffraction orders propagate and the other orders are evanescent. The interference pattern resulting in the region of the overlap of the propagated orders is a true two-beam pattern of the same period as the e-beam mask. The photoresist coated wafer is placed in the plane of the interference pattern and is rigidly held by a mechanical fixture. The contrast of the interference pattern depends on the degree of spatial coherence of the excimer laser, on the coherence length, the polarization state of the beam used to illuminate the surface relief phase grating, and on the distance between the wafer and the surface relief phase grating. The degree of spatial coherence was increased by a restriction of the plane wave spectrum which has been attained at the cost of energy throughput. In addition, the TM-polarization was blocked. This was done by a polarizer and a spatial filter. The theoretical background of the experiment will be discussed as well as practical problems.

© (2002) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Gerald Fuetterer ; Waltraud Herbst ; Joerg Rottstegge ; Margit Ferstl ; Michael Sebald, et al.
"Interference patterning of gratings with a period of 150 nm at a wavelength of 157 nm", Proc. SPIE 4691, Optical Microlithography XV, 1703 (July 15, 2002); doi:10.1117/12.474559; http://dx.doi.org/10.1117/12.474559


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.