Properties and performance of near-UV reflectivity control layers (RCL)

Thomas J. Lynch; Valerie R. Paradis; Mark A. Spak; Wayne M. Moreau

doi:10.1117/12.175340

16 May 1994 Properties and performance of near-UV reflectivity control layers (RCL)

Thomas J. Lynch, Valerie R. Paradis, Mark A. Spak, Wayne M. Moreau

Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175340
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

To overcome the limitations of two-component formulations, we have synthesized polymeric dyes which offer no or low bake processing and have suitable I line absorbance in films less than 100 nm thick. The polymeric RCL films are synthesized from absorbing dyes which are grafted onto polymers which are insoluble in the resist casting solvents. We have utilized amine dyes which are imidized onto polymeric backbones by a one step synthesis. The peak absorbance of the grafted dye after imidization undergoes a blue shift of about 30 nm and thus appropriate H line dyes are used to achieve I line peak absorbance.

Citation Download Citation

Thomas J. Lynch, Valerie R. Paradis, Mark A. Spak, and Wayne M. Moreau "Properties and performance of near-UV reflectivity control layers (RCL)", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175340

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