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Proceedings Article

Metrology issues associated with submicron linewidths

[+] Author Affiliations
Khoi A. Phan, John L. Nistler, Bhanwar Singh

Advanced Micro Devices, Inc. (USA)

Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, 424 (July 1, 1991); doi:10.1117/12.44455
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From Conference Volume 1464

  • Integrated Circuit Metrology, Inspection, and Process Control V
  • William H. Arnold
  • San Jose, CA | March 01, 1991

abstract

The three conventional techniques--optical, low voltage scanning electron microscopy (LVSEM), and electrical linewidth measurement--continue to be employed, but each technique has unique applications, problems, and limitations. In this paper these techniques are investigated for submicron linewidth metrology. A great deal of emphasis is placed on the calibration of these tools and the potential for problems associated with the tools.

© (1991) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Khoi A. Phan ; John L. Nistler and Bhanwar Singh
"Metrology issues associated with submicron linewidths", Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, 424 (July 1, 1991); doi:10.1117/12.44455; http://dx.doi.org/10.1117/12.44455


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