Repair Of Photomasks With Focussed Ion Beams

B. W. Ward; D. C. Shaver; M. L. Ward

doi:10.1117/12.947491

20 June 1985 Repair Of Photomasks With Focussed Ion Beams

B. W. Ward, D. C. Shaver, M. L. Ward

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947491
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

The development of high-brightness liquid metal ion sources [1] has made it possible to produce focussed ion beams with submicrometer dimensions and moderate current density (about 1 A/cm²). Several classes of applications for focussed ion beam systems have been proposed including direct implantation, lithography, and micromachining. Though focussed ion beams have some unique and attractive properties, they are unlikely to replace mainstream lithography and broad-beam implantation technologies. For instance, for applications such as high-dose source-drain implantations, the writing rate would be limited to only a few thousand pixels per second, resulting in excessive writing times. On the other hand, for certain niche applications a focussed ion beam may be the method of choice. As an example, a custom wafer requiring threshold adjustment implants (10¹³ cm^-2 and 1% coverage) could be processed in less than an hour and would require no mask generation or resist processing and exposure steps.

Citation Download Citation

B. W. Ward, D. C. Shaver, and M. L. Ward "Repair Of Photomasks With Focussed Ion Beams", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947491

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