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Dr. T. Early
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Publications (1)
Proceedings Article | 1 May 2023 Poster + Paper
Spin speed impact on photoresist thin film properties and EUV lithographic performance
Yinjie Cen, ChoongBong Lee, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Emad Aqad, Rochelle Rena, Tyler Paul, Tom Penniman, Jason Behnke, Julia Early, Benjamin Foltz
Proceedings Volume 12498, 124981W (2023) https://doi.org/10.1117/12.2659101
KEYWORDS: Photoresist materials, Film thickness, Lithography, Extreme ultraviolet lithography, Line width roughness, Thin films, Surface roughness
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