Ms. Akiko Mimotogi Profile

Akiko Mimotogi

at Toshiba Materials Co Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 22 March 2016 Paper

Design for nanoimprint lithography: total layout refinement utilizing NIL process simulation

Sachiko Kobayashi, Motofumi Komori, Inanami Ryoichi, Kyoji Yamashita, Akiko Mimotogi, Ji-Young Im, Masayuki Hatano, Takuya Kono, Shimon Maeda

Proceedings Volume 9777, 977708 (2016) https://doi.org/10.1117/12.2219052

KEYWORDS: Nanoimprint lithography, Lithography, Design for manufacturing, Photoresist processing, Computer simulations, Computational lithography, Design for manufacturability, Nanolithography, Optical lithography, Ultraviolet radiation, Double patterning technology, Calibration, Semiconductors, Optics manufacturing

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Proceedings Article | 12 April 2013 Paper

Solutions with precise prediction for thermal aberration error in low-k1 immersion lithography

Kazuya Fukuhara, Akiko Mimotogi, Takuya Kono, Hajime Aoyama, Taro Ogata, Naonori Kita, Tomoyuki Matsuyama

Proceedings Volume 8683, 86830U (2013) https://doi.org/10.1117/12.2011691

KEYWORDS: Photomasks, Diffraction, Lithographic illumination, Ions, Neodymium, Semiconductors, Critical dimension metrology, Immersion lithography, Control systems, Lithography

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Proceedings Article | 19 May 2008 Paper

Dependence of mask topography effects on pattern variation under hyper-NA lithography

Akiko Mimotogi, Masamitsu Itoh, Shoji Mimotogi, Kazuya Sato, Takashi Sato, Satoshi Tanaka, Soichi Inoue

Proceedings Volume 7028, 70283K (2008) https://doi.org/10.1117/12.793127

KEYWORDS: Photomasks, Diffraction, Waveguides, Lithography, Near field, Semiconducting wafers, Phase shifts, Transmittance, Data modeling, Thin films

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Proceedings Article | 7 March 2008 Paper

Prediction of imaging performance of immersion lithography using high refractive index fluid

Takashi Sato, Masamitsu Itoh, Akiko Mimotogi, Shoji Mimotogi, Kazuya Sato, Satoshi Tanaka

Proceedings Volume 6924, 69242F (2008) https://doi.org/10.1117/12.772283

KEYWORDS: Photomasks, Transmittance, Pellicles, Lithographic illumination, Lithography, Immersion lithography, Polarization, Diffraction, Refractive index, Projection systems

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Proceedings Article | 14 May 2007 Paper

Mask topography effects of hole patterns on hyper-NA lithography

Akiko Mimotogi, Masamitsu Itoh, Shoji Mimotogi, Kazuya Sato, Takashi Sato, Satoshi Tanaka

Proceedings Volume 6607, 66071F (2007) https://doi.org/10.1117/12.728963

KEYWORDS: Photomasks, Diffraction, Waveguides, Lithography, Factor analysis, Logic, Near field, Data modeling, Thin films, Focus stacking software

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SPIE Journal Paper | 1 October 2006

Impact of polarization on an attenuated phase shift mask with ArF hyper-numerical aperture lithography

Takashi Sato, Ayako Endo, Akiko Mimotogi, Shoji Mimotogi, Kazuya Sato, Satoshi Tanaka

JM3, Vol. 5, Issue 04, 043001, (October 2006) https://doi.org/10.1117/12.10.1117/1.2397065

KEYWORDS: Polarization, Photomasks, Transmittance, Chromium, Phase shifts, Lithography, Lithographic illumination, Immersion lithography, Semiconducting wafers, Finite-difference time-domain method

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Proceedings Article | 19 May 2006 Paper

Assessment of wafer pattern prediction accuracy by introducing effectively equivalent mask patterns

M. Satake, A. Mimotogi, S. Tanaka, S. Mimotogi, K. Hashimoto, S. Inoue

Proceedings Volume 6283, 62831B (2006) https://doi.org/10.1117/12.681874

KEYWORDS: Photomasks, Thin films, Optical proximity correction, Data modeling, Semiconducting wafers, Lithography, Waveguides, Computer simulations, Modulation, Finite-difference time-domain method

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Proceedings Article | 12 May 2005 Paper

Impact of polarization for an attenuated phase-shift mask with ArF hyper-NA lithography

Takashi Sato, Ayako Endo, Akiko Mimotogi, Shoji Mimotogi, Kazuya Sato, Satoshi Tanaka

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598458

KEYWORDS: Polarization, Photomasks, Phase shifts, Chromium, Lithography, Lithographic illumination, Semiconducting wafers, Electroluminescence, Transmittance, Tolerancing

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Proceedings Article | 12 May 2005 Paper

Evaluation of extendibility for Fourier diffraction theory for topographical mask structure under hyper NA lithography

Satoshi Tanaka, Akiko Mimotogi, Soichi Inoue

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600447

KEYWORDS: Photomasks, Lithography, Diffraction, Lithographic illumination, Optical proximity correction, Reticles, Immersion lithography, Phase shifts, Electromagnetic simulation, Optical lithography

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Showing 5 of 9 publications

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